Method of manufacturing a wire grid polarizer for a display apparatus
First Claim
1. A method of manufacturing a wire gird polarizer for a display apparatus, the method comprising the steps of:
- forming a first layer on a base substrate including an active area and a peripheral area surrounding the active area;
forming a hard mask layer on the first layer;
coating an imprint resin on the hard mask layer;
forming an imprint resin pattern by imprinting a stamp on the imprint resin, wherein the stamp is larger than the base substrate;
forming a hard mask pattern by patterning the hard mask layer using the imprint resin pattern;
forming a wire grid pattern layer by pattering the first layer using the hard mask pattern, wherein the wire grid pattern layer includes a plurality of protrusions in the active area and in the peripheral area;
forming a photoresist pattern in the active area on the base substrate, wherein the photoresist pattern does not overlap the hard mask pattern and the wire grid pattern layer in the peripheral area;
removing the hard mask pattern and the wire grid pattern layer in the peripheral area using the photoresist pattern as an etch barrier; and
forming a capping layer on the wire grid pattern.
1 Assignment
0 Petitions
Accused Products
Abstract
A method of manufacturing a wire grid polarizer for a display apparatus includes the steps of forming a first layer on a base substrate including an active area and a peripheral area surrounding the active area, forming a hard mask layer on the first layer, coating an imprint resin on the hard mask layer, forming an imprint resin pattern by imprinting a stamp on the imprint resin, wherein the stamp is larger than the base substrate, forming a hard mask pattern by patterning the hard mask layer using the imprint resin pattern, forming a wire grid pattern layer by pattering the first layer using the hard mask pattern, forming a photoresist pattern in the active area on the base substrate, removing the hard mask pattern and the wire grid pattern layer in the peripheral area using the photoresist pattern, and forming a capping layer on the wire grid pattern.
10 Citations
20 Claims
-
1. A method of manufacturing a wire gird polarizer for a display apparatus, the method comprising the steps of:
-
forming a first layer on a base substrate including an active area and a peripheral area surrounding the active area; forming a hard mask layer on the first layer; coating an imprint resin on the hard mask layer; forming an imprint resin pattern by imprinting a stamp on the imprint resin, wherein the stamp is larger than the base substrate; forming a hard mask pattern by patterning the hard mask layer using the imprint resin pattern; forming a wire grid pattern layer by pattering the first layer using the hard mask pattern, wherein the wire grid pattern layer includes a plurality of protrusions in the active area and in the peripheral area; forming a photoresist pattern in the active area on the base substrate, wherein the photoresist pattern does not overlap the hard mask pattern and the wire grid pattern layer in the peripheral area; removing the hard mask pattern and the wire grid pattern layer in the peripheral area using the photoresist pattern as an etch barrier; and forming a capping layer on the wire grid pattern. - View Dependent Claims (2, 3, 4, 5, 6)
-
-
7. A method of manufacturing a wire gird polarizer for the display apparatus, the method comprising the steps of:
-
forming a first layer on a base substrate including an active area and a peripheral area surrounding the active area; forming a hard mask layer on the first layer; coating an imprint resin on the hard mask layer; forming an imprint resin pattern in a first area by imprinting a stamp on the imprint resin, wherein the stamp is smaller than the base substrate, wherein the first area is bigger than the active area; forming a hard mask pattern by patterning the hard mask layer using the imprint resin pattern; forming a wire grid pattern layer by pattering the first layer using the hard mask pattern, wherein the wire grid pattern layer includes a plurality of protrusions in the active area and in the peripheral area; forming a photoresist pattern in the active area on the base substrate on which the wire grid pattern is formed, wherein the photoresist pattern does not overlap the hard mask pattern and the wire grid pattern layer in the peripheral area; removing the hard mask pattern and the wire grid pattern layer in the peripheral area using the photoresist pattern as an etch barrier; and forming a capping layer on the wire grid pattern. - View Dependent Claims (8, 9, 10, 11)
-
-
12. A method of manufacturing a wire gird polarizer for a display apparatus, the method comprising the steps of:
-
forming a first layer on a base substrate including an active area and a peripheral area surrounding the active area; forming a hard mask layer on the first layer; coating an imprint resin on the hard mask layer; forming an imprint resin pattern in a first area by imprinting a stamp on the imprint resin, wherein the stamp is smaller than the base substrate, wherein the first area is bigger than the active area; forming a hard mask pattern by patterning the hard mask layer using the imprint resin pattern; forming a first photoresist pattern in an active area on the base substrate on which the hard mask pattern is formed, wherein the photoresist pattern does not overlap the hard mask pattern and the first layer in the peripheral area; removing the hard mask pattern and the first layer in the peripheral area using the first photoresist pattern as an etch barrier; and forming a wire grid pattern layer by patterning the first layer using the hard mask pattern; and forming a capping layer on the wire grid pattern. - View Dependent Claims (13, 14, 15, 16, 17, 18, 19, 20)
-
Specification