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Optimization flows of source, mask and projection optics

  • US 10,401,732 B2
  • Filed: 03/06/2017
  • Issued: 09/03/2019
  • Est. Priority Date: 11/10/2010
  • Status: Active Grant
First Claim
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1. A method for improving a lithographic process for imaging a portion of a design layout using a lithographic projection apparatus comprising projection optics, the method comprising:

  • obtaining a subset of patterns from the portion of the design layout and obtaining an initial illumination source;

    optimizing together, by a hardware computer system, the subset of patterns, the illumination source, and the projection optics, wherein the optimizing comprising configuring a characteristic of the projection optics used to project the subset of patterns onto a radiation-sensitive substrate by using at least the illumination source, and wherein the configuring the characteristic of the projection optics comprises determining a phase shift to be introduced in the projection optics with respect to a phase of the illumination source.

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