Collar, conical showerheads and/or top plates for reducing recirculation in a substrate processing system
First Claim
1. A substrate processing system comprising:
- a processing chamber;
a showerhead including a faceplate, a stem portion and a cylindrical base portion;
a collar connecting the showerhead to a top surface of the processing chamber,wherein the collar defines a gas channel to receive secondary purge gas and a plurality of gas slits to direct the secondary purge gas from the gas channel in a radially outward and downward direction; and
a conical surface arranged adjacent to the cylindrical base portion and around the stem portion of the showerhead,wherein a top surface of the processing chamber includes an inverted conical surface arranged adjacent to the top surface and sidewalls of the processing chamber, wherein the inverted conical surface extends radially outward from (i) the top surface adjacent to the collar to (ii) the sidewalls, andwherein the conical surface and the inverted conical surface define an angled gas channel in a first gap between the conical surface and the inverted conical surface and extending radially outward from the collar to an outer edge of the cylindrical base portion and to the sidewalls of the processing chamber to define a second gap between a radially outer portion of the cylindrical base portion and the sidewalls of the processing chamber.
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Accused Products
Abstract
A substrate processing system includes a processing chamber and a showerhead including a faceplate, a stem portion and a cylindrical base portion. A collar connects the showerhead to a top surface of the processing chamber. The collar defines a gas channel to receive secondary purge gas and a plurality of gas slits to direct the secondary purge gas from the gas channel in a radially outward and downward direction. A conical surface is arranged adjacent to the cylindrical base and around the stem portion of the showerhead. An inverted conical surface is arranged adjacent to a top surface and sidewalls of the processing chamber. The conical surface and the inverted conical surface define an angled gas channel from the plurality of gas slits to a gap defined between a radially outer portion of the cylindrical base portion and the sidewalls of the processing chamber.
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Citations
10 Claims
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1. A substrate processing system comprising:
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a processing chamber; a showerhead including a faceplate, a stem portion and a cylindrical base portion; a collar connecting the showerhead to a top surface of the processing chamber, wherein the collar defines a gas channel to receive secondary purge gas and a plurality of gas slits to direct the secondary purge gas from the gas channel in a radially outward and downward direction; and a conical surface arranged adjacent to the cylindrical base portion and around the stem portion of the showerhead, wherein a top surface of the processing chamber includes an inverted conical surface arranged adjacent to the top surface and sidewalls of the processing chamber, wherein the inverted conical surface extends radially outward from (i) the top surface adjacent to the collar to (ii) the sidewalls, and wherein the conical surface and the inverted conical surface define an angled gas channel in a first gap between the conical surface and the inverted conical surface and extending radially outward from the collar to an outer edge of the cylindrical base portion and to the sidewalls of the processing chamber to define a second gap between a radially outer portion of the cylindrical base portion and the sidewalls of the processing chamber. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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Specification