Semiconductor device and method for manufacturing the same
First Claim
1. A semiconductor device comprising:
- a first insulator over a substrate;
a first oxide semiconductor over the first insulator;
a second oxide semiconductor in contact with at least part of a top surface of the first oxide semiconductor;
a first conductor in contact with at least part of a top surface of the second oxide semiconductor;
a second conductor that is in contact with at least part of the top surface of the second oxide semiconductor and faces the first conductor;
a third oxide semiconductor that is over the first conductor and the second conductor and is in contact with at least part of the top surface of the second oxide semiconductor;
a second insulator over the third oxide semiconductor;
a third conductor which is over the second insulator and at least part of which overlaps with a region between the first conductor and the second conductor; and
a third insulator which is over the third conductor and at least part of which is in contact with a top surface of the first insulator,wherein a side surface portion of the first oxide semiconductor, a side surface portion of the third oxide semiconductor, and a side surface portion of the second insulator are substantially aligned with one another,wherein the first insulator comprises a first region that is in contact with the third insulator and a second region that is in contact with the first oxide semiconductor, and a thickness of the first region is less than a thickness of the second region, andwherein the first oxide semiconductor comprises a first region that is in contact with the third oxide semiconductor and a second region that is in contact with the second oxide semiconductor, and a thickness of the first region of the first oxide semiconductor is less than a thickness of the second region of the first oxide semiconductor.
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Accused Products
Abstract
A transistor includes a first insulator over a substrate; a first oxide thereover; a second oxide in contact with at least part of the top surface of the first oxide; a first conductor and a second conductor each in contact with at least part of the top surface of the second oxide; a third oxide that is over the first conductor and the second conductor and is in contact with at least part of the top surface of the second oxide; a second insulator thereover; a third conductor which is over the second insulator and at least part of which overlaps with a region between the first conductor and the second conductor; and a third insulator which is over the third conductor and at least part of which is in contact with the top surface of the first insulator. The thickness of a region of the first insulator that is in contact with the third insulator is less than the thickness of a region of the first insulator that is in contact with the first oxide.
163 Citations
11 Claims
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1. A semiconductor device comprising:
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a first insulator over a substrate; a first oxide semiconductor over the first insulator; a second oxide semiconductor in contact with at least part of a top surface of the first oxide semiconductor; a first conductor in contact with at least part of a top surface of the second oxide semiconductor; a second conductor that is in contact with at least part of the top surface of the second oxide semiconductor and faces the first conductor; a third oxide semiconductor that is over the first conductor and the second conductor and is in contact with at least part of the top surface of the second oxide semiconductor; a second insulator over the third oxide semiconductor; a third conductor which is over the second insulator and at least part of which overlaps with a region between the first conductor and the second conductor; and a third insulator which is over the third conductor and at least part of which is in contact with a top surface of the first insulator, wherein a side surface portion of the first oxide semiconductor, a side surface portion of the third oxide semiconductor, and a side surface portion of the second insulator are substantially aligned with one another, wherein the first insulator comprises a first region that is in contact with the third insulator and a second region that is in contact with the first oxide semiconductor, and a thickness of the first region is less than a thickness of the second region, and wherein the first oxide semiconductor comprises a first region that is in contact with the third oxide semiconductor and a second region that is in contact with the second oxide semiconductor, and a thickness of the first region of the first oxide semiconductor is less than a thickness of the second region of the first oxide semiconductor. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. A semiconductor device comprising:
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a first insulating film; a first oxide semiconductor film over the first insulating film; a second oxide semiconductor film over the first oxide semiconductor film; a source electrode over the second oxide semiconductor film; a drain electrode over the second oxide semiconductor film; a second insulating film over the source electrode and the drain electrode; a gate electrode over the second insulating film; and a third insulating film over the gate electrode, wherein the first insulating film comprises a first region that is in contact with the third insulating film and a second region that is in contact with the first oxide semiconductor film, and a thickness of the first region is less than a thickness of the second region, and wherein a difference between the thickness of the first region and the thickness of the second region is greater than or equal to 10 nm. - View Dependent Claims (11)
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Specification