Optimization of source and bandwidth for new and existing patterning devices

• US 10,416,566 B2
• Filed: 11/30/2016
• Issued: 09/17/2019
• Est. Priority Date: 12/14/2015
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV), Cymer Incorporated (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Conley, Willard Earl, Hsieh, Wei-An, Chiou, Tsann-Bim, Hsieh, Cheng-Hsien
• Primary Examiner(s): Nguyen, Hung
• Application Number:
  US15/781,970
• Publication Number:
  US 20180356734A1
• Time in Patent Office: 1,021 Days
• Field of Search: 355 52, 355 53, 355 55
• CPC Class Codes: G03F 1/36 Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes
• CPC Class Codes: G03F 7/701 Off-axis setting using an aperture
• CPC Class Codes: G03F 7/70125 Use of illumination settings tailored to particular mask patterns details of setting means G03F7/70091
• CPC Class Codes: G03F 7/70258 Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
• CPC Class Codes: G03F 7/70441 Optical proximity correction [OPC]
• CPC Class Codes: G03F 7/705 Modelling or simulating from physical phenomena up to complete wafer processes or whole workflow in wafer productions
• CPC Class Codes: G03F 7/70575 Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
• CPC Class Codes: G03F 7/70625 Dimensions, e.g. line width, critical dimension [CD], profile, sidewall angle or edge roughness

Abstract

A method to improve a lithographic process of imaging a portion of a design layout onto a substrate using a lithographic apparatus, the method including: computing a multi-variable cost function, the multi-variable cost function being a function a plurality of design variables that represent characteristics of the lithographic process; and reconfiguring one or more of the characteristics of the lithographic process by adjusting one or more of the design variables until a certain termination condition is satisfied; wherein a bandwidth of a radiation source of the lithographic apparatus is allowed to change during the reconfiguration.

Claims

1. A method to improve a lithographic process of imaging a portion of a design layout onto a substrate using a lithographic apparatus, the method comprising:

computing, by a hardware computer system, a multi-variable cost function of a plurality of design variables that represent characteristics of the lithographic process, the multi-variable cost function being a function of a bandwidth of a radiation source of the lithographic apparatus, or being a function of a variable that is a function of the bandwidth or that affects the bandwidth; and

reconfiguring, by the hardware computer system, one or more of the characteristics of the lithographic process by adjusting one or more of the design variables and re-computing the multi-variable cost function based on the adjusted one or more design variables until a certain termination condition is satisfied.

2. The method of claim 1, wherein the reconfiguration is under a constraint that any geometrical characteristics of a patterning device comprising the design layout are not allowed to change.

3. The method of claim 1, wherein the bandwidth is a full width at half maximum (FWHM) bandwidth, or wherein the bandwidth is an E95 bandwidth.

4. The method of claim 1, wherein reconfiguring the one or more of the characteristics of the lithographic process improves an image quality of the portion of the design layout.

5. The method of claim 1, wherein reconfiguring the one or more of the characteristics of the lithographic process increases latitude of at least one of the design variables.

6. The method of claim 5, wherein the latitude is depth of focus or exposure latitude.

7. The method of claim 1, wherein the cost function evaluates one or more selected from the following:

edge placement error, critical dimension, a resist contour characteristic, worst defect size, exposure latitude, image shift, mask error enhancement factor or focus.

18. The method of claim 1, wherein the bandwidth or the variable is a function of one or more of the plurality of design variables.

8. A computer program product comprising a non-transitory computer-readable medium having instructions recorded thereon, the instructions, when executed by a computer system, configured to cause at least:

computation of a multi-variable cost function of a plurality of design variables that represent characteristics of a lithographic process of imaging a portion of a design layout onto a substrate using the lithographic apparatus, the multi-variable cost function being a function of a bandwidth of a radiation source of a lithographic apparatus, or being a function of a variable that is a function of the bandwidth or that affects the bandwidth; and

reconfiguration of one or more of the characteristics of the lithographic process by adjusting one or more of the design variables and re-computing the multi-variable cost function based on the adjusted one or more design variables until a certain termination condition is satisfied.

14. The computer program product of claim 8, wherein the reconfiguration is under a constraint that any geometrical characteristics of a patterning device comprising the design layout are not allowed to change.

15. The computer program product of claim 8, wherein the bandwidth is a full width at half maximum (FWHM) bandwidth, or wherein the bandwidth is an E95 bandwidth.

16. The computer program product of claim 8, wherein reconfiguration of the one or more of the characteristics of the lithographic process increases latitude of at least one of the design variables.

19. The computer program product of claim 8, wherein the bandwidth or the variable is a function of one or more of the plurality of design variables.

20. The computer program product of claim 8, wherein the reconfiguring the one or more of the characteristics of the lithographic process causes the bandwidth to have a value greater than the minimum that hardware of the radiation source allows.

9. A computer program product comprising a non-transitory computer-readable medium having instructions recorded thereon, the instructions, when executed by a computer system, configured to cause at least:

computation of a multi-variable cost function, the multi-variable cost function being a function of a plurality of design variables that represent characteristics of a lithographic process of imaging a portion of a design layout onto a substrate using a lithographic apparatus; and

reconfiguration of one or more of the characteristics of the lithographic process by adjusting one or more of the design variables and re-computing the multi-variable cost function based on the adjusted one or more design variables until a certain termination condition is satisfied,

wherein a bandwidth of a radiation source of the lithographic apparatus is allowed to change during the reconfiguration.

10. The computer program product of claim 9, wherein the reconfiguration is under a constraint that any geometrical characteristics of a patterning device comprising the design layout are not allowed to change.

17. The computer program product of claim 9, wherein the bandwidth is a full width at half maximum (FWHM) bandwidth, or wherein the bandwidth is an E95 bandwidth.

11. A method to improve a lithographic process of imaging a portion of a design layout onto a substrate using a lithographic apparatus, the method comprising:

computing, by a hardware computer system, a multi-variable cost function, the multi-variable cost function being a function of a plurality of design variables that represent characteristics of the lithographic process; and

reconfiguring, by the hardware computer system, one or more of the characteristics of the lithographic process by adjusting one or more of the design variables and re-computing the multi-variable cost function based on the adjusted one or more design variables until a certain termination condition is satisfied,

wherein a bandwidth of a radiation source of the lithographic apparatus is allowed to change during the reconfiguration.

12. The method of claim 11, wherein the reconfiguration is under a constraint that any geometrical characteristics of a patterning device comprising the design layout are not allowed to change.

13. The method of claim 11, wherein the bandwidth is a full width at half maximum (FWHM) bandwidth, or wherein the bandwidth is an E95 bandwidth.