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Electro-optical diffractive waveplate beam shaping system

  • US 10,423,045 B2
  • Filed: 11/14/2016
  • Issued: 09/24/2019
  • Est. Priority Date: 11/14/2016
  • Status: Active Grant
First Claim
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1. An optical beam shaping system comprising:

  • (a) at least one illumination source; and

    (b) at least one diffractive waveplate diffuser, each diffuser comprising a layer of optically anisotropic material wherein the orientation of anisotropy axis is spatially patterned in a predetermined manner; and

    wherein optical retardance introduced by said layer of optically anisotropic material is one-half wave at an operating wavelength; and

    wherein the phase of said illumination source propagated through the film is shaped to produce a selected diffraction pattern in a target plane when illuminated with said illumination source; and

    wherein shaping of an optical phase is obtained by a local angle of anisotropy axis in a predetermined orientation pattern of the layer of said optically anisotropic material with respect to a reference direction.

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