Method for producing a mirror element
First Claim
1. A method for producing a mirror element, comprising:
- a) providing a substrate; and
b) forming a layer stack on the substrate, wherein the layer stack has at least one reflection layer system;
wherein the layer stack is formed such that a setpoint curvature of the mirror element for a predetermined operating temperature is generated by a bending force exerted by the layer stack,wherein the substrate has an actual curvature deviating from the setpoint curvature of the mirror element prior to said forming of the layer stack,wherein the bending force exerted by the layer stack is at least partly generated by performing a post-treatment for changing a layer tension of the layer stack, andwherein the post-treatment for changing the layer tension of the layer stack produces an irreversible change in the actual curvature of the substrate.
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Accused Products
Abstract
A method for producing a mirror element, in particular for a microlithographic projection exposure apparatus includes: providing a substrate (101, 102, 103, 104, 201, 202, 301, 302, 401, 402, 501, 502, 801, 901, 951, 961); and forming a layer stack (111, 112, 113, 114, 211, 212, 311, 312, 411, 412, 511, 512) on the substrate, wherein the layer stack is formed so that a setpoint curvature of the mirror element for a predetermined operating temperature is generated by a bending force exerted by the layer stack, wherein the substrate has a curvature deviating from the setpoint curvature of the mirror element prior to the formation of the layer stack, and wherein the bending force exerted by the layer stack is at least partly generated by virtue of a post-treatment for changing the layer tension of the layer stack.
23 Citations
10 Claims
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1. A method for producing a mirror element, comprising:
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a) providing a substrate; and b) forming a layer stack on the substrate, wherein the layer stack has at least one reflection layer system; wherein the layer stack is formed such that a setpoint curvature of the mirror element for a predetermined operating temperature is generated by a bending force exerted by the layer stack, wherein the substrate has an actual curvature deviating from the setpoint curvature of the mirror element prior to said forming of the layer stack, wherein the bending force exerted by the layer stack is at least partly generated by performing a post-treatment for changing a layer tension of the layer stack, and wherein the post-treatment for changing the layer tension of the layer stack produces an irreversible change in the actual curvature of the substrate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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Specification