Oxide etch selectivity systems and methods
First Claim
1. A substrate processing system, the substrate processing system comprising:
- a first gas inlet;
a pedestal configured to support a substrate;
a showerhead positioned between the first gas inlet and the pedestal, the showerhead comprising an electrically conductive plate defining a first plurality of openings, the showerhead further defining a plurality of apertures;
a partition positioned between the pedestal and the showerhead, the partition defining a second plurality of openings;
a second gas inlet positioned at the showerhead and configured to provide a precursor that flows through the plurality of apertures of the showerhead before entering a region defined between the partition and the showerhead;
a plasma region defined between the first gas inlet and the showerhead;
a substrate processing region defined between the partition and the pedestal; and
a power supply configured to strike plasma in the plasma region defined between the first gas inlet and the showerhead while maintaining plasma-free the substrate processing region and the region defined between the partition and the showerhead.
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Accused Products
Abstract
Embodiments of the present technology may include a method of etching a substrate. The method may include striking a plasma discharge in a plasma region. The method may also include flowing a fluorine-containing precursor into the plasma region to form a plasma effluent. The plasma effluent may flow into a mixing region. The method may further include introducing a hydrogen-and-oxygen-containing compound into the mixing region without first passing the hydrogen-and-oxygen-containing compound into the plasma region. Additionally, the method may include reacting the hydrogen-and-oxygen-containing compound with the plasma effluent in the mixing region to form reaction products. The reaction products may flow through a plurality of openings in a partition to a substrate processing region. The method may also include etching the substrate with the reaction products in the substrate processing region.
1974 Citations
20 Claims
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1. A substrate processing system, the substrate processing system comprising:
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a first gas inlet; a pedestal configured to support a substrate; a showerhead positioned between the first gas inlet and the pedestal, the showerhead comprising an electrically conductive plate defining a first plurality of openings, the showerhead further defining a plurality of apertures; a partition positioned between the pedestal and the showerhead, the partition defining a second plurality of openings; a second gas inlet positioned at the showerhead and configured to provide a precursor that flows through the plurality of apertures of the showerhead before entering a region defined between the partition and the showerhead; a plasma region defined between the first gas inlet and the showerhead; a substrate processing region defined between the partition and the pedestal; and a power supply configured to strike plasma in the plasma region defined between the first gas inlet and the showerhead while maintaining plasma-free the substrate processing region and the region defined between the partition and the showerhead. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
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15. A plasma processing system, the plasma processing system comprising:
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a first gas inlet; a pedestal configured to support a substrate; a showerhead positioned between the first gas inlet and the pedestal, the showerhead comprising an electrically conductive plate defining a first plurality of openings and a plurality of apertures; a partition positioned between the pedestal and the showerhead, the partition defining a second plurality of openings, and wherein a region is defined between the showerhead and the partition; an ion suppressor comprising a third plurality of openings, the ion suppressor positioned between the showerhead and the first gas inlet; a second gas inlet positioned to deliver a precursor within the showerhead and through the plurality of apertures of the showerhead before entering the region defined between the showerhead and the partition ; a plasma region defined between the first gas inlet and the showerhead; a substrate processing region defined between the partition and the pedestal; and a power supply configured to strike a plasma discharge in the plasma region while maintaining the substrate processing region and the region defined between the showerhead and the partition substantially plasma free. - View Dependent Claims (16, 17, 18, 19, 20)
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Specification