Surface treatment for an implant surface

• US 10,426,577 B2
• Filed: 07/16/2018
• Issued: 10/01/2019
• Est. Priority Date: 08/11/2015
• Status: Active Grant

• Current Assignee: Biomet 3i LLC (Zimvie Incorporated)
• Original Assignee: Biomet 3i LLC (Zimvie Incorporated)
• Inventors: Mandanici, Daniel, Suttin, Zachary B., Lin, Keng-Min, Sanchez, Olga S.
• Primary Examiner(s): Stewart, Alvin J
• Application Number:
  US16/036,537
• Publication Number:
  US 20180318049A1
• Time in Patent Office: 442 Days
• CPC Class Codes: A61C 13/0007 using sand blasting
• CPC Class Codes: A61C 13/0012 Electrolytic coating
• CPC Class Codes: A61C 2008/0046 Textured surface, e.g. roughness, microstructure A61C8/0013 takes precedence
• CPC Class Codes: A61C 8/0015 being a conversion layer, e.g. oxide layer
• CPC Class Codes: A61C 8/0022 Self-screwing A61C8/0028 takes precedence
• CPC Class Codes: A61C 8/006 with polygonal positional means, e.g. hexagonal or octagonal
• CPC Class Codes: A61C 8/0062 Catch or snap type connection
• CPC Class Codes: A61C 8/0075 Implant heads specially designed for receiving an upper structure if separable from the implant A61C8/005
• CPC Class Codes: A61L 2400/18 Modification of implant surfaces in order to improve biocompatibility, cell growth, fixation of biomolecules, e.g. plasma treatment
• CPC Class Codes: A61L 27/10 Ceramics or glasses
• CPC Class Codes: A61L 27/28 Materials for coating prostheses
• CPC Class Codes: C23F 1/30 for etching other metallic material

Abstract

An implant system and a method of forming the implant system including an implant to be implanted into living bone. The implant includes titanium. The implant includes a first surface geometry on a first portion of a surface of the implant and a second surface geometry on a second portion of the surface of the implant. The first surface geometry includes at least a submicron topography including tube-like structures and the second surface geometry includes a first micro-scale topography, a second micro-scale topography superimposed on the first topography, and a submicron topography superimposed on the first and second micro-scale topographies, the submicron topography including the tube-like structures.

Claims

1. An implant system including an implant to be implanted into living bone, the implant being formed of a material comprising titanium, the implant comprising:

a first surface geometry on a first portion of a surface of the implant, the first surface geometry including;

a first submicron topography including tube-like structures; and

a second surface geometry on a second portion of the surface of the implant, the second surface geometry including;

a first micro-scale topography;

a second micro-scale topography superimposed on the first topography, the second micro-scale topography being generally less coarse than the first micro-scale topography; and

a second submicron topography superimposed on the first and second micro-scale topographies, the submicron topography including the tube-like structures.

2. The implant system of claim 1, wherein the tube-like structures have heights in the range of about 200 nanometers to about 400 nanometers.

3. The implant system of claim 1, wherein the tube-like structures have diameters in the range of about 10 to about 400 nanometers.

4. The implant system of claim 1, wherein the tube-like structures are formed from titanium dioxide.

5. The implant system of claim 1, wherein the first micro-scale topography includes peak-to-valley heights of about 1 microns to about 30 microns.

6. The implant system of claim 5, wherein the first micro-scale topography includes peak-to-valley heights of about 10 microns to about 20 microns.

7. The implant system of claim 5, wherein the second micro-scale topography includes peak-to-valley heights of less than about 10 microns and peak-to-peak distances of less than about 3 microns.

8. The implant system of claim 7, wherein the first surface geometry on the first portion of the surface of the implant includes a third micro-scale topography, wherein the first submicron topography is superimposed on the third micro-scale topography.

9. The implant system of claim 8, wherein third micro-scale topography includes peak-to-valley heights of less than about 10 microns and peak-to-peak distances of less than about 3 microns.

10. The implant system of claim 8, wherein the first surface geometry on the first portion of the surface of the implant includes a fourth micro-scale topography, wherein the third micro-scale topography is superimposed on the fourth micro-scale topography.

11. The implant system of claim 10, wherein the fourth micro-scale topography is generally less coarse than the first micro-scale topography.

12. The implant system of claim 1, wherein the first surface topography extends from a coronal end of the implant to an intermediate point.

13. The implant system of claim 1, wherein the first surface topography extends along about fifty percent or less of a length of the implant.

14. The implant system of claim 1, wherein the second surface topography extends from the intermediate point toward an apical end of the implant.

15. The implant system of claim 1, wherein the implant system further includes:

a mating component configured to be coupled with the implant, the abutment including a third surface topography including one of;

a fourth submicron topography including the tube-like structures; and

a fifth micro-scale topography superimposed on fourth submicron topography.

16. A method of forming an implant system including an implant to be implanted into living bone, the implant being formed of a material comprising titanium, the method comprising:

forming a first surface geometry on a first portion of a surface of the implant, including;

adding a first submicron topography to the first portion of the surface of the implant, the first submicron topography including tube-like structures;

forming a second surface geometry on a second portion of the surface of the implant, including

deforming the second portion of the surface of the implant to produce a first micro-scale topography;

removing a portion of the second portion of the surface to produce a second micro-scale topography superimposed on the first micro-scale topography, the second micro-scale topography, being generally less coarse than the first micro-scale topography; and

adding a second submicron topography superimposed on the first and second micro-scale topographies, the second submicron topography including the tube-like structures.

17. The method of claim 16, wherein the deforming the implant surface to produce the first micro-scale topography includes grit blasting the surface.

18. The method of claim 16, wherein the removing the portion of the second portion of the surface to produce the second micro-scale topography includes:

removing a native oxide layer from the implant surface; and

acid etching the resulting surface.

19. The method of claim 16, wherein the tube-like structures have heights in the range of about 200 nanometers to about 400 nanometers and have diameters in the range of about 10 to about 400 nanometers, wherein the first micro-scale topography includes peak-to-valley heights of about 10 microns to about 20 microns, and wherein the second micro-scale topography includes peak-to-valley heights of less than about 10 microns and peak-to-peak distances of less than about 3 microns.

20. The method of claim 16, wherein the adding the first submicron topography and the adding the second submicron topography includes potentiostatic anodization.