Method and device for generating a reference image in the characterization of a mask for microlithography
First Claim
1. A method for generating a reference image in the characterization of a mask for microlithography, wherein the mask comprises a plurality of structures and wherein the reference image is generated by simulation of the imaging of said mask, said imaging being effected by a given optical system, both using a rigorous electromagnetic simulation and using a Kirchhoff simulation, wherein the method comprises the following steps:
- a) assigning each structure of said plurality of structures either to a first category or to a second category;
b) calculating, using one or more data processors, a plurality of first partial spectra for structures of the first category with implementation of rigorous electromagnetic simulations;
c) calculating, using the one or more data processors, a second partial spectrum for structures of the second category with implementation of a Kirchhoff simulation;
d) generating, using the one or more data processors, a hybrid spectrum on the basis of the first partial spectra and the second partial spectrum; and
e) generating, using the one or more data processors, the reference image with implementation of an optical forward propagation of said hybrid spectrum in the optical system.
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Abstract
The invention relates to a method and a device for generating a reference image in the characterization of a mask for microlithography, wherein the mask comprises a plurality of structures and wherein the reference image is generated by simulation of the imaging of said mask, said imaging being effected by a given optical system, both using a rigorous simulation and using a Kirchhoff simulation, wherein the method comprises the following steps: assigning each structure of said plurality of structures either to a first category or to a second category, calculating a plurality of first partial spectra for structures of the first category with implementation of rigorous simulations, calculating a second partial spectrum for structures of the second category with implementation of a Kirchhoff simulation, generating a hybrid spectrum on the basis of the first partial spectra and the second partial spectrum, and generating the reference image with implementation of an optical forward propagation of said hybrid spectrum in the optical system.
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Citations
20 Claims
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1. A method for generating a reference image in the characterization of a mask for microlithography, wherein the mask comprises a plurality of structures and wherein the reference image is generated by simulation of the imaging of said mask, said imaging being effected by a given optical system, both using a rigorous electromagnetic simulation and using a Kirchhoff simulation, wherein the method comprises the following steps:
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a) assigning each structure of said plurality of structures either to a first category or to a second category; b) calculating, using one or more data processors, a plurality of first partial spectra for structures of the first category with implementation of rigorous electromagnetic simulations; c) calculating, using the one or more data processors, a second partial spectrum for structures of the second category with implementation of a Kirchhoff simulation; d) generating, using the one or more data processors, a hybrid spectrum on the basis of the first partial spectra and the second partial spectrum; and e) generating, using the one or more data processors, the reference image with implementation of an optical forward propagation of said hybrid spectrum in the optical system. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
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12. A device for generating a reference image in the characterization of the mask for microlithography, in which the device is configured to implement a process for generating the reference image, wherein the mask comprises a plurality of structures and wherein the reference image is generated by simulation of the imaging of said mask, said imaging being effected by a given optical system, both using a rigorous electromagnetic simulation and using a Kirchhoff simulation, wherein the process includes:
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a) assigning each structure of said plurality of structures either to a first category or to a second category; b) calculating, using one or more data processors, a plurality of first partial spectra for structures of the first category with implementation of rigorous electromagnetic simulations; c) calculating, using the one or more data processors, a second partial spectrum for structures of the second category with implementation of a Kirchhoff simulation; d) generating, using the one or more data processors, a hybrid spectrum on the basis of the first partial spectra and the second partial spectrum; and e) generating, using the one or more data processors, the reference image with implementation of an optical forward propagation of said hybrid spectrum in the optical system. - View Dependent Claims (13, 14, 15, 16, 17, 18, 19, 20)
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Specification