Parasitic capacitance compensation circuit
First Claim
1. A parasitic capacitance compensation circuit for a switch, the circuit comprising:
- a first inductor operably coupled between a first terminal and a second terminal, the first inductor causing a first inductance between the first and second terminals, the first and second terminals configured to be operably coupled, respectively, to first and second terminals of the switch; and
a second inductor operably coupled between the first and second terminals and parallel to the first inductor, the second inductor causing a second inductance between the first and second terminals of the switch when the second inductor is switched in, the second inductor being switched in when a peak voltage on the first and second terminals falls below a first voltage;
wherein the first inductance tunes out substantially all of a parasitic capacitance of the switch when the switch is OFF and the peak voltage is above the first voltage; and
wherein the first and second inductances collectively tune out substantially all of the parasitic capacitance of the switch when the switch is OFF and the peak voltage is below the first voltage.
3 Assignments
0 Petitions
Accused Products
Abstract
In one embodiment, a parasitic capacitance compensation circuit for a switch is disclosed that includes a first inductor operably coupled between a first terminal and a second terminal, and a second inductor operably coupled between the first and second terminals and parallel to the first inductor. The second inductor is switched in when a peak voltage on the first and second terminals falls below a first voltage. The first inductance tunes out substantially all of a parasitic capacitance of the switch when the switch is OFF and the peak voltage is above the first voltage. The first and second inductances collectively tune out substantially all of the parasitic capacitance of the switch when the switch is OFF and the peak voltage is below the first voltage.
38 Citations
21 Claims
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1. A parasitic capacitance compensation circuit for a switch, the circuit comprising:
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a first inductor operably coupled between a first terminal and a second terminal, the first inductor causing a first inductance between the first and second terminals, the first and second terminals configured to be operably coupled, respectively, to first and second terminals of the switch; and a second inductor operably coupled between the first and second terminals and parallel to the first inductor, the second inductor causing a second inductance between the first and second terminals of the switch when the second inductor is switched in, the second inductor being switched in when a peak voltage on the first and second terminals falls below a first voltage; wherein the first inductance tunes out substantially all of a parasitic capacitance of the switch when the switch is OFF and the peak voltage is above the first voltage; and wherein the first and second inductances collectively tune out substantially all of the parasitic capacitance of the switch when the switch is OFF and the peak voltage is below the first voltage. - View Dependent Claims (2, 3, 4, 5, 6)
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7. A semiconductor processing tool comprising:
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a plasma chamber configured to deposit a material onto a substrate or etch a material from the substrate; and an impedance matching circuit operably coupled to the plasma chamber, matching circuit comprising; an RF input configured to be operably coupled to an RF source; an RF output operably coupled to the plasma chamber; and an electronically variable capacitor (EVC), the EVC comprising discrete capacitors, each discrete capacitor having a corresponding switch for switching in and out the discrete capacitor, each corresponding switch comprising a parasitic capacitance compensation circuit comprising; a first inductor operably coupled between a first terminal and a second terminal of the corresponding switch, the first inductor causing a first inductance between the first and second terminals, the first and second terminals configured to be operably coupled, respectively, to first and second terminals of the switch; and a second inductor operably coupled between the first and second terminals and parallel to the first inductor, the second inductor causing a second inductance between the first and second terminals of the switch when the second inductor is switched in, the second inductor being switched in when a peak voltage on the first and second terminals falls below a first voltage; wherein the first inductance tunes out substantially all of a parasitic capacitance of the switch when the switch is OFF and the peak voltage is above the first voltage; and wherein the first and second inductances collectively tune out substantially all of the parasitic capacitance of the switch when the switch is OFF and the peak voltage is below the first voltage. - View Dependent Claims (8, 9, 10, 11, 12)
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13. A method of compensating for parasitic capacitance for a switch, the method comprising:
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operably coupling a first inductor between a first terminal and a second terminal, the first inductor causing a first inductance between the first and second terminals, the first and second terminals configured to be operably coupled, respectively, to first and second terminals of the switch; operably coupling a second inductor between the first and second terminals and parallel to the first inductor, the second inductor causing a second inductance between the first and second terminals of the switch when the second inductor is switched in; and switching in the second inductor when a peak voltage on the first and second terminals falls below a first voltage; wherein the first inductance tunes out substantially all of a parasitic capacitance of the switch when the switch is OFF and the peak voltage is above the first voltage; and wherein the first and second inductances collectively tune out substantially all of the parasitic capacitance of the switch when the switch is OFF and the peak voltage is below the first voltage. - View Dependent Claims (14, 15, 16, 17, 18, 19, 20)
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21. A method of fabricating a semiconductor, the method comprising:
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placing a substrate in a plasma chamber configured to deposit a material layer onto the substrate or etch a material layer from the substrate; energizing plasma within the plasma chamber by coupling RF power from an RF source into the plasma chamber to perform a deposition or etching; and while energizing the plasma, carrying out an impedance match by an impedance matching network coupled between a load and an RF source, wherein the impedance matching network comprises; an RF input configured to operably couple to the RF source; an RF output configured to operably couple to the plasma chamber; and an electronically variable capacitor (EVC), the EVC comprising discrete capacitors, each discrete capacitor having a corresponding switch for switching in and out the discrete capacitor, each corresponding switch comprising a parasitic capacitance compensation circuit comprising; a first inductor operably coupled between a first terminal and a second terminal of the corresponding switch, the first inductor causing a first inductance between the first and second terminals, the first and second terminals configured to be operably coupled, respectively, to first and second terminals of the switch; and a second inductor operably coupled between the first and second terminals and parallel to the first inductor, the second inductor causing a second inductance between the first and second terminals of the switch when the second inductor is switched in, the second inductor being switched in when a peak voltage on the first and second terminals falls below a first voltage; wherein the first inductance tunes out substantially all of a parasitic capacitance of the switch when the switch is OFF and the peak voltage is above the first voltage; and wherein the first and second inductances collectively tune out substantially all of the parasitic capacitance of the switch when the switch is OFF and the peak voltage is below the first voltage.
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Specification