Systems and methods for radial and azimuthal control of plasma uniformity
First Claim
1. A system that generates a plasma for processing a workpiece, comprising:
- a process chamber that is operable to be evacuated;
a housing that defines a waveguide cavity;
a first conductive plate disposed within the housing, wherein the first conductive plate faces the process chamber and is disposed on a distal side of the waveguide cavity from the process chamber;
one or more adjustment devices that couple with the first conductive plate and the housing, wherein the one or more adjustment devices are operable to adjust at least a position of the first conductive plate within a range of positions;
a second conductive plate, coupled with the housing and interposed between the waveguide cavity and the process chamber, the second conductive plate forming a plurality of apertures therein for allowing electromagnetic radiation within the waveguide cavity to propagate, through the apertures, into the process chamber;
a dielectric plate that seals off the process chamber from the waveguide cavity such that the waveguide cavity is not evacuated when the process chamber is evacuated; and
one or more electronics sets that transmit the electromagnetic radiation into the waveguide cavity, such that the plasma forms when at least one process gas is within the process chamber, and the electromagnetic radiation propagates into the process chamber from the waveguide cavity.
1 Assignment
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Accused Products
Abstract
A system includes a process chamber, a housing that defines a waveguide cavity, and a first conductive plate within the housing. The first conductive plate faces the process chamber. The system also includes one or more adjustment devices that can adjust at least a position of the first conductive plate, and a second conductive plate, coupled with the housing, between the waveguide cavity and the process chamber. Electromagnetic radiation can propagate from the waveguide cavity into the process chamber through apertures in the second conductive plate. The system also includes a dielectric plate that seals off the process chamber from the waveguide cavity, and one or more electronics sets that transmit the electromagnetic radiation into the waveguide cavity. A plasma forms when at least one process gas is within the chamber, and the electromagnetic radiation propagates into the process chamber from the waveguide cavity.
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Citations
20 Claims
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1. A system that generates a plasma for processing a workpiece, comprising:
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a process chamber that is operable to be evacuated; a housing that defines a waveguide cavity; a first conductive plate disposed within the housing, wherein the first conductive plate faces the process chamber and is disposed on a distal side of the waveguide cavity from the process chamber; one or more adjustment devices that couple with the first conductive plate and the housing, wherein the one or more adjustment devices are operable to adjust at least a position of the first conductive plate within a range of positions; a second conductive plate, coupled with the housing and interposed between the waveguide cavity and the process chamber, the second conductive plate forming a plurality of apertures therein for allowing electromagnetic radiation within the waveguide cavity to propagate, through the apertures, into the process chamber; a dielectric plate that seals off the process chamber from the waveguide cavity such that the waveguide cavity is not evacuated when the process chamber is evacuated; and one or more electronics sets that transmit the electromagnetic radiation into the waveguide cavity, such that the plasma forms when at least one process gas is within the process chamber, and the electromagnetic radiation propagates into the process chamber from the waveguide cavity. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18)
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19. A plasma processing system, comprising:
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a process chamber that is operable to be evacuated; one or more process gas supplies for introducing one or more process gases into the process chamber; a housing that defines a waveguide cavity; one or more electronics sets operable to transmit electromagnetic radiation into the waveguide cavity, wherein each of the one or more electronics sets matches its driving impedance to an impedance presented by the waveguide cavity to the electromagnetic radiation; a first conductive plate, disposed within the housing and on a distal side of the waveguide cavity from the process chamber; at least three adjustment devices that couple with the first conductive plate and the housing, wherein the at least three adjustment devices are operable to adjust at least a position of the first conductive plate within a range of positions, and a tilt of the first conductive plate with respect to the housing; a second conductive plate, coupled with the housing and interposed between the waveguide cavity and the process chamber, the second conductive plate forming a plurality of apertures therein for allowing the electromagnetic radiation within the waveguide cavity to propagate, through the apertures, into the process chamber; and a dielectric plate that seals off the process chamber from the waveguide cavity such that the waveguide cavity is not evacuated when the process chamber is evacuated; wherein; the waveguide cavity is capable of supporting an eigenmode between the first and second conductive plates when the first conductive plate is adjusted to an eigenmode position within the range of positions, and the one or more electronics sets transmit the electromagnetic radiation into the waveguide cavity; and a plasma forms when at least one of the one or more process gases is within the process chamber, and the electromagnetic radiation propagates into the process chamber from the waveguide cavity. - View Dependent Claims (20)
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Specification