Oriented alumina substrate for epitaxial growth
First Claim
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1. An oriented alumina substrate for epitaxial growth, comprising:
- alumina crystalline grains constituting a surface of the oriented alumina substrate,the alumina crystalline grains having a tilt angle of 0.4°
to 0.98° and
an average sintered grain size of 10 μ
m or more.
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Abstract
An oriented alumina substrate for epitaxial growth according to an embodiment of the present invention includes crystalline grains constituting a surface thereof, the crystalline grains having a tilt angle of 0.1° or more and less than 1.0° and an average sintered grain size of 10 μm or more.
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8 Claims
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1. An oriented alumina substrate for epitaxial growth, comprising:
-
alumina crystalline grains constituting a surface of the oriented alumina substrate, the alumina crystalline grains having a tilt angle of 0.4°
to 0.98° and
an average sintered grain size of 10 μ
m or more. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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Specification