Oriented alumina substrate for epitaxial growth
First Claim
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1. An oriented alumina substrate for epitaxial growth, comprising:
- alumina crystalline grains constituting a surface of the oriented alumina substrate,the alumina crystalline grains having a tilt angle of 1.2°
to 2.5° and
an average sintered grain size of 20 μ
m or more.
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Abstract
An oriented alumina substrate for epitaxial growth according to an embodiment of the present invention includes crystalline grains constituting a surface thereof, the crystalline grains having a tilt angle of 1° or more and 3° or less and an average sintered grain size of 20 μm or more.
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4 Claims
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1. An oriented alumina substrate for epitaxial growth, comprising:
-
alumina crystalline grains constituting a surface of the oriented alumina substrate, the alumina crystalline grains having a tilt angle of 1.2°
to 2.5° and
an average sintered grain size of 20 μ
m or more. - View Dependent Claims (2, 3, 4)
-
Specification