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Methods for manufacturing well structures for low-noise chemical sensors

  • US 10,436,742 B2
  • Filed: 11/29/2017
  • Issued: 10/08/2019
  • Est. Priority Date: 01/08/2013
  • Status: Active Grant
First Claim
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1. A method for manufacturing a chemical detection device, the method comprising:

  • forming a chemical sensor having a sensing surface;

    depositing a dielectric material on the sensing surface;

    performing a first etch process to partially etch the dielectric material to define an opening over the sensing surface and leave remaining dielectric material on the sensing surface;

    forming an etch protect material on a sidewall of the opening; and

    performing a second etch process to selective etching the remaining dielectric material using the etch protect material as an etch mask, thereby exposing the sensing surface.

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