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Metrology by reconstruction

  • US 10,437,158 B2
  • Filed: 12/16/2016
  • Issued: 10/08/2019
  • Est. Priority Date: 12/31/2015
  • Status: Active Grant
First Claim
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1. A method comprising:

  • obtaining a plurality of measurement results from a pattern on a substrate respectively using a plurality of substrate measurement recipes performed by a metrology apparatus that illuminates the pattern with radiation, the substrate processed by a lithography process; and

    reconstructing, using a computer, the pattern using the plurality of measurement results, to obtain a reconstructed pattern;

    wherein each of the plurality of substrate measurement recipes corresponds to one of a plurality of diffraction-based optical measurements to the pattern defined by a plurality of parameterized models respectively, each measurement result is a diffraction image obtained by using one corresponding substrate measurement recipe, and a reconstruction algorithm depends on the plurality of parameterized models.

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