Metrology by reconstruction
First Claim
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1. A method comprising:
- obtaining a plurality of measurement results from a pattern on a substrate respectively using a plurality of substrate measurement recipes performed by a metrology apparatus that illuminates the pattern with radiation, the substrate processed by a lithography process; and
reconstructing, using a computer, the pattern using the plurality of measurement results, to obtain a reconstructed pattern;
wherein each of the plurality of substrate measurement recipes corresponds to one of a plurality of diffraction-based optical measurements to the pattern defined by a plurality of parameterized models respectively, each measurement result is a diffraction image obtained by using one corresponding substrate measurement recipe, and a reconstruction algorithm depends on the plurality of parameterized models.
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Abstract
Disclosed herein is a method comprising: obtaining a plurality of measurement results from a pattern on a substrate respectively using a plurality of substrate measurement recipes, the substrate processed by a lithography process; reconstruct, using a computer, the pattern using the plurality of measurement results, to obtain a reconstructed pattern.
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Citations
13 Claims
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1. A method comprising:
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obtaining a plurality of measurement results from a pattern on a substrate respectively using a plurality of substrate measurement recipes performed by a metrology apparatus that illuminates the pattern with radiation, the substrate processed by a lithography process; and reconstructing, using a computer, the pattern using the plurality of measurement results, to obtain a reconstructed pattern; wherein each of the plurality of substrate measurement recipes corresponds to one of a plurality of diffraction-based optical measurements to the pattern defined by a plurality of parameterized models respectively, each measurement result is a diffraction image obtained by using one corresponding substrate measurement recipe, and a reconstruction algorithm depends on the plurality of parameterized models. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13)
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