Electrode contacts
First Claim
1. A device structure providing contact to conductive layers via a deep trench structure, the device structure comprising:
- a material structure including a top surface and a side wall integral with and joining the top surface;
a first conductive layer deposited over the material structure on the top surface and the side wall;
at least one material layer deposited on the first conductive layer, the at least one material layer being continuous on the top surface of the material structure, continuously covering a first portion of the side wall, and having at least one discontinuity on a second portion of the side wall; and
a second conductive layer deposited on the at least one material layer, the second conductive layer in contact with the first conductive layer on the second portion of the side wall and separated from the first conductive layer by the at least one material layer on the first portion of the side wall,the at least one material layer comprised of material different from materials of the first and second conductive layers, the at least one material layer preventing electrical contact between the first and second conductive layers on the first portion of the side wall, and the at least one discontinuity in the at least one material layer for providing electrical contact between the first and second conductive layers on the second portion of the side wall.
2 Assignments
0 Petitions
Accused Products
Abstract
A device structure providing contact to conductive layers via a deep trench structure is disclosed. The device includes a first dielectric layer including a first opening. A first conductive layer is deposited over the first dielectric layer and the first opening. A second dielectric layer is deposited on the first conductive layer. The second dielectric layer includes a second opening. A second conductive layer is deposited over the second dielectric layer and the first and second openings. A semiconductor layer is deposited on the second dielectric layer such that the semiconductor layer is not continuous on at least part of the walls of the first or second openings. A top electrode layer is deposited on the semiconductor layer. The top electrode layer is in contact with the second conductive layer on at least part of the walls of the first or second openings.
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Citations
16 Claims
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1. A device structure providing contact to conductive layers via a deep trench structure, the device structure comprising:
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a material structure including a top surface and a side wall integral with and joining the top surface; a first conductive layer deposited over the material structure on the top surface and the side wall; at least one material layer deposited on the first conductive layer, the at least one material layer being continuous on the top surface of the material structure, continuously covering a first portion of the side wall, and having at least one discontinuity on a second portion of the side wall; and a second conductive layer deposited on the at least one material layer, the second conductive layer in contact with the first conductive layer on the second portion of the side wall and separated from the first conductive layer by the at least one material layer on the first portion of the side wall, the at least one material layer comprised of material different from materials of the first and second conductive layers, the at least one material layer preventing electrical contact between the first and second conductive layers on the first portion of the side wall, and the at least one discontinuity in the at least one material layer for providing electrical contact between the first and second conductive layers on the second portion of the side wall. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. A method of fabricating a device structure providing contact to conductive layers via a deep trench structure, the method comprising:
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fabricating a material structure including a top surface and a side wall integral with and joining the top surface; depositing a first conductive layer over the material structure on the top surface and the side wall; depositing at least one material layer on the conductive layer, the at least one material layer being continuous on the top surface of the material structure, continuously covering a first portion of the side wall, and having at least one discontinuity on a second portion of the side wall; and depositing a second conductive layer on the at least one material layer, the second conductive layer in contact with the first conductive layer on the second portion of the side wall and separated from the first conductive layer by the at least one material layer on the first portion of the side wall, the at least one material layer comprised of material different from materials of the first and second conductive layers, the at least one material layer preventing electrical contact between the first and second conductive layers on the first portion of the side wall, and the at least one discontinuity in the at least one material layer for providing electrical contact between the first and second conductive layers on the second portion of the side wall. - View Dependent Claims (10, 11, 12, 13, 14, 15, 16)
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Specification