Toroidal plasma processing apparatus with a shaped workpiece holder
First Claim
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1. A plasma processing apparatus comprising:
- a) a toroidal-shape plasma vessel comprising a process chamber;
b) a magnetic core surrounding a portion of the toroidal-shape plasma vessel;
c) an RF power supply having an output that is electrically connected to the magnetic core, the RF power supply energizing the magnetic core, thereby forming a toroidal plasma loop discharge in the toroidal-shape plasma vessel;
d) a workpiece holder comprising at least one face that supports the workpiece during growth; and
e) a plasma guiding structure being shaped and dimensioned so as to constrain a section of a plasma in the toroidal plasma loop discharge to travel substantially perpendicular to a normal to the at least one face that supports a workpiece during growth.
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Abstract
A plasma processing apparatus includes a toroidal-shape plasma vessel comprising a process chamber. A magnetic core surrounds a portion of the toroidal-shape plasma vessel. An RF power supply having an output that is electrically connected to the magnetic core energizes the magnetic core, thereby forming a toroidal plasma loop discharge in the plasma chamber. A workpiece holder is positioned in the toroidal-shape plasma vessel and includes at least one face. A plasma guiding structure is shaped and dimensioned so as to constrain a section of plasma in the toroidal plasma loop to travel substantially perpendicular to a normal to the at least one face.
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Citations
54 Claims
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1. A plasma processing apparatus comprising:
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a) a toroidal-shape plasma vessel comprising a process chamber; b) a magnetic core surrounding a portion of the toroidal-shape plasma vessel; c) an RF power supply having an output that is electrically connected to the magnetic core, the RF power supply energizing the magnetic core, thereby forming a toroidal plasma loop discharge in the toroidal-shape plasma vessel; d) a workpiece holder comprising at least one face that supports the workpiece during growth; and e) a plasma guiding structure being shaped and dimensioned so as to constrain a section of a plasma in the toroidal plasma loop discharge to travel substantially perpendicular to a normal to the at least one face that supports a workpiece during growth. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26)
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27. A plasma processing apparatus comprising:
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a) a toroidal-shape plasma vessel comprising a process chamber; b) a magnetic core surrounding a portion of the toroidal-shape plasma vessel; c) an RF power supply having an output that is electrically connected to the magnetic core, the RF power supply energizing the magnetic core, thereby forming a toroidal plasma loop discharge in the toroidal-shape plasma vessel; and d) a workpiece holder comprising a first and second section each comprising at least one face being shaped and dimensioned so as to constrain a section of a plasma in the toroidal plasma loop discharge to travel substantially perpendicular to a normal surface of the at least one face of the first and second sections. - View Dependent Claims (28, 29, 30, 31, 32, 33, 34, 35, 36, 37, 38, 39, 40, 41, 42, 43, 44, 45)
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46. A method for growing single-crystal diamond material, the method comprising:
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a) providing a toroidal-shape plasma vessel comprising a process chamber; b) positioning a magnetic core surrounding a portion of the toroidal-shape plasma vessel; c) energizing the magnetic core with RF radiation, thereby forming a toroidal plasma loop discharge in the toroidal-shape plasma vessel; d) providing a workpiece holder comprising at least one face that supports a workpiece during growth; e) providing a plasma guiding structure being shaped and dimensioned so as to constrain a section of a plasma in the toroidal plasma loop to travel substantially perpendicular to a normal to the at least one face that support the workpiece during growth; and f) growing single-crystal diamond material on the workpiece. - View Dependent Claims (47, 48, 49, 50, 51, 52, 53, 54)
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Specification