Method of operating a microlithographic projection apparatus and illumination system of such an apparatus

• US 10,444,631 B2
• Filed: 02/20/2018
• Issued: 10/15/2019
• Est. Priority Date: 09/23/2015
• Status: Active Grant

• Current Assignee: CARL Zeiss SMT GmbH (Carl-Zeiss-Stiftung)
• Original Assignee: CARL Zeiss SMT GmbH (Carl-Zeiss-Stiftung)
• Inventors: Deguenther, Markus, Eisenmenger, Johannes, Hilt, Stefanie, Korb, Thomas, Schlesener, Frank, Maul, Manfred
• Primary Examiner(s): Nguyen, Hung
• Application Number:
  US15/899,521
• Publication Number:
  US 20180217506A1
• Time in Patent Office: 602 Days
• Field of Search: 355 52, 355 53, 355 55, 355 67- 71
• CPC Class Codes: G02B 26/0833 the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD G02B26/0825 takes precedence; micromechanical devices in general B81B
• CPC Class Codes: G02B 3/0062 Stacked lens arrays, i.e. refractive surfaces arranged in at least two planes, without structurally separate optical elements in-between
• CPC Class Codes: G03F 7/70075 Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
• CPC Class Codes: G03F 7/70116 Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets
• CPC Class Codes: G03F 7/702 Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
• CPC Class Codes: G03F 7/7085 Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load

Abstract

An illumination system of a microlithographic projection apparatus includes a spatial light modulator having a modulation surface including a plurality of micromirrors. Each micromirror includes a mirror surface having an orientation that can be changed individually for each micromirror. For at least one of the micromirrors, at least one parameter that is related to the mirror surface is measured. The orientation of the mirror surfaces is controlled depending on the at least one measured parameter. A light pattern is produced on the modulation surface, and an image of the light pattern is formed on an optical integrator that has a plurality of light entrance facets. Images of the light entrance facets are superimposed on a mask.

Claims

1. A method of operating an illumination system of a microlithographic projection apparatus, the illumination system comprising a spatial light modulator comprising a modulation surface comprising a plurality of micromirrors arranged in a modulation plane, each micromirror comprising a mirror surface having an individually changeable orientation, the method comprising:

for at least one of the micromirrors, measuring a parameter related to the mirror surface to provide a measured parameter;

controlling the orientation of the mirror surface depending on the measured parameter;

producing a light pattern on the modulation surface;

forming an image of the light pattern on a raster field plane of an optical integrator comprising a plurality of light entrance facets arranged in the raster field plane, the raster field plane being optically conjugate to the modulation plane; and

superimposing images of the light entrance facets on a mask.

2. The method of claim 1, wherein the measured parameter is selected from the group consisting of a position of the mirror surface and an orientation of the mirror surface.

3. The method of claim 1, wherein measuring the parameter comprises measuring an angular irradiance distribution at least at one field point in a mask plane or a plane that is optically conjugate to the mask plane.

4. The method of claim 3, wherein the measured parameter comprises the orientation of the mirror surface, and the method comprises measuring the angular irradiance distribution at a plurality of field points in the mask plane or a plane that is optically conjugate to the mask plane.

5. The method of claim 4, comprising simultaneously measuring the angular irradiance distribution at the plurality of field points.

6. The method of claim 5, wherein the illumination system comprises a plurality of position resolving light sensors arranged at positions that are associated with the plurality of field points, and the method comprises using each light sensor to measure the angular irradiance distribution for the associated field point.

7. The method of claim 1, wherein measuring the parameter comprises measuring an irradiance at least at one field point in a mask plane or a plane that is optically conjugate to the mask plane.

8. The method of claim 7, wherein the measured parameter is the orientation of the mirror surface, and the method comprises measuring irradiance at a plurality of field points in the mask plane or a plane that is optically conjugate to the mask plane.

9. The method of claim 1, wherein measuring the parameter comprises computing the based on a shape of the mirror surfaces, a spatial arrangement of the modulation surface relative to the light entrance facets, and a shape of the light entrance facets.

10. The method of claim 1, wherein the parameter is measured while controlling the orientations of the mirror surfaces so that adjacent mirror surfaces do not superimpose light on the mask.

11. The method of claim 1, wherein the parameter is measured while detecting a position of a marker point that is fixedly arranged with respect to the spatial light modulator.

12. The method of claim 1, wherein the modulation surface is observed by a camera which detects light that has been reflected or scattered by the micromirrors or by structures between the micromirrors.

13. The method of claim 1, wherein controlling the orientation of the mirror surface comprises laterally shifting a control pattern when the mirror surface has been measured as being laterally displaced.

21. The method of claim 1, wherein the method comprises imaging the mirror surface of each micromirror onto the raster field plane.

22. The method of claim 1, wherein:

the illumination system further comprises a pupil forming unit which comprises a mirror array comprising a plurality of mirrors; and

the method further comprises illuminating a spot on the modulation plane at a position that is variable by changing a deflection angle produced by a mirror of the pupil forming unit.

14. A method of operating an illumination system of a microlithographic projection apparatus comprising a spatial light modulator comprising a modulation surface comprising a plurality of micromirrors arranged in a modulation plane, each micromirror comprising a mirror surface having an individually changeable orientation, the method comprising:

for at least one of the micromirrors, measuring a parameter related to the mirror surface to provide a measured parameter;

controlling the orientation of the mirror surface depending on the measured parameter;

producing a light pattern on the modulation surface; and

forming an image of the light pattern on a field plane which is optically conjugate to the modulation plane.

19. The method of claim 14, wherein the method comprises imaging the mirror surface of each micromirror onto the raster field plane.

20. The method of claim 14, wherein:

the illumination system further comprises a pupil forming unit which comprises a mirror array comprising a plurality of mirrors; and

the method further comprises illuminating a spot on the modulation plane at a position that is variable by changing a deflection angle produced by a mirror of the pupil forming unit.

15. An illumination system, comprising:

a spatial light modulator comprising a modulation surface which comprises a plurality of micromirrors arranged in a modulation plane, each micromirror comprising a mirror surface having an individually changeable orientation;

a measuring device configured to measure, for at least one of the micromirrors, a parameter that is related to the mirror surface to provide a measured parameter;

a control unit configured to control the orientation of the micromirrors depending on the measured parameter;

an optical integrator comprising a plurality of light entrance facets arranged in a raster field plane which is optically conjugate to the modulation plane; and

an imaging optical system configured to provide an image of the modulation surface on the raster field plane.

18. The illumination system of claim 15, further comprising a pupil forming unit which comprises a mirror array comprising a plurality of mirrors, wherein, for each mirror of the mirror array of the pupil forming unit, the mirror is configured to illuminate a spot on the modulation plane at a position that is variable by changing a deflection angle produced by the mirror.

16. An illumination system, comprising:

a spatial light modulator comprising a modulation surface comprising a plurality of micromirrors arranged in a modulation plane, each micro-mirror comprising a mirror surface having an individually changeable orientation;

a measuring device configured to measure, for at least one of the micromirrors, a parameter related to the mirror surface to provide a measured parameter;

a control unit configured to control the orientation of the micromirrors depending on the measured parameter; and

an imaging optical system configured to form an image of the modulation surface on a field plane that is optically conjugate to the modulation plane.

17. The illumination system of claim 16, further comprising a pupil forming unit which comprises a mirror array comprising a plurality of mirrors, wherein, for each mirror of the mirror array of the pupil forming unit, the mirror is configured to illuminate a spot on the modulation plane at a position that is variable by changing a deflection angle produced by the mirror.