Sensor assembly and method for determining respective positions of a number of mirrors of a lithography system
First Claim
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1. A sensor arrangement configured to ascertain a respective position of a number of mirrors of a lithography apparatus, the sensor arrangement comprising:
- a number of position sensor apparatuses, each position sensor apparatus comprising;
a measuring unit to provide an optical position signal of a position of a mirror in the case of exposure by a light beam;
a light source to expose the measuring unit to the light beam;
a detection unit comprising a plurality of photodetectors to output an analog electrical position signal by detecting the provided optical position signal; and
a signal-processing unit comprising an A/D converter to convert the analog electrical position signal into a digital electrical position signal, the light source and the signal-processing unit being provided in an integrated component arranged in a vacuum housing; and
an evaluation apparatus to ascertain the position of the mirror via the digital electrical position signal.
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Abstract
A sensor arrangement includes at least one position sensor apparatus for providing a position signal for a mirror and an evaluation apparatus for ascertaining the position of the mirror depending on the position signal.
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Citations
30 Claims
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1. A sensor arrangement configured to ascertain a respective position of a number of mirrors of a lithography apparatus, the sensor arrangement comprising:
a number of position sensor apparatuses, each position sensor apparatus comprising; a measuring unit to provide an optical position signal of a position of a mirror in the case of exposure by a light beam; a light source to expose the measuring unit to the light beam; a detection unit comprising a plurality of photodetectors to output an analog electrical position signal by detecting the provided optical position signal; and a signal-processing unit comprising an A/D converter to convert the analog electrical position signal into a digital electrical position signal, the light source and the signal-processing unit being provided in an integrated component arranged in a vacuum housing; and an evaluation apparatus to ascertain the position of the mirror via the digital electrical position signal. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29)
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30. A method of ascertaining a respective position of a number of mirrors of a lithography apparatus, the method comprising:
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a) exposing a measuring unit to a light beam; b) detecting an optical position signal, provided by the measuring unit, by a detection unit for outputting an analog electrical position signal; c) converting the analog electrical position signal into a digital electrical position signal by an A/D converter, a) to c) being performed by an integrated component arranged in a vacuum housing, integrating the light source, the detection unit and the A/D converter; and d) ascertaining the position of the mirror via the digital electrical position signal.
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Specification