Plasma processing apparatus
First Claim
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1. A plasma processing apparatus for plasma processing a substrate comprising:
- a chamber comprising one or more walls, in which a portion of the walls of the chamber is a single turn electrode structure formed from a metallic material and configured to act as a primary winding of an inductively coupled plasma source; and
an electrical signal supply device for supplying an electrical signal that drives the single turn electrode structure as a primary winding of an inductively coupled plasma source to sustain an inductively coupled plasma within the chamber,wherein the single turn electrode structure is a single non-continuous band forming a single turn around a periphery of the chamber.
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Abstract
A plasma processing apparatus for plasma processing a substrate comprising includes a chamber having one or more walls, in which a portion of the walls of the chamber is an electrode structure formed from a metallic material and configured to act as a primary winding of an inductively coupled plasma source, and an electrical signal supply device for supplying an electrical signal that drives the electrode structure as a primary winding of an inductively coupled plasma source to sustain an inductively coupled plasma within the chamber.
7 Citations
22 Claims
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1. A plasma processing apparatus for plasma processing a substrate comprising:
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a chamber comprising one or more walls, in which a portion of the walls of the chamber is a single turn electrode structure formed from a metallic material and configured to act as a primary winding of an inductively coupled plasma source; and an electrical signal supply device for supplying an electrical signal that drives the single turn electrode structure as a primary winding of an inductively coupled plasma source to sustain an inductively coupled plasma within the chamber, wherein the single turn electrode structure is a single non-continuous band forming a single turn around a periphery of the chamber. - View Dependent Claims (6, 7, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20)
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2. A plasma processing apparatus for plasma processing a substrate comprising:
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a chamber comprising one or more walls, in which a portion of the walls of the chamber is single turn electrode structure formed from a metallic material and configured to act as a primary winding of an inductively coupled plasma source; and an electrical signal supply device for supplying an electrical signal that drives the single turn electrode structure as a primary winding of an inductively coupled plasma source to sustain an inductively coupled plasma within the chamber, wherein the single turn electrode structure comprises a plurality of spaced apart band segments forming a single turn around a periphery of the chamber. - View Dependent Claims (3, 4, 5, 8, 21, 22)
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Specification