System and method for dispensing liquid spin-on glass (SOG) onto semiconductor wafers
First Claim
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1. A method of controlling deposition of liquid spin-on glass (SOG) onto a semiconductor wafer, comprising:
- detecting, using a first sensor, the liquid SOG outside of a dispenser nozzle in an abnormal length relative to the dispenser nozzle;
adjusting, using a controller, a suck back (SB) valve to withdraw liquid SOG from the abnormal length;
comparing a sensed amount of liquid SOG deposited onto the semiconductor wafer, from a second sensor, with at least one operating parameter prior to the adjusting;
pausing sensing of an amount of liquid SOG dispensed onto the semiconductor wafer based on the sensed amount of liquid SOG deposited being outside the at least one operating parameter; and
storing at least one signal from the second sensor in the controller based on the sensed amount of liquid SOG deposited being outside the at least one operating parameter.
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Abstract
A device and method for dispensing liquid spin-on glass (SOG) onto semiconductor wafers. The method includes dispensing liquid SOG through a dispenser nozzle, detecting liquid SOG outside of the dispenser nozzle, indicating the presence of liquid SOG in an abnormal length relative to the dispenser nozzle and adjusting a suck back (SB) valve to withdraw liquid SOG from the abnormal length.
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Citations
20 Claims
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1. A method of controlling deposition of liquid spin-on glass (SOG) onto a semiconductor wafer, comprising:
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detecting, using a first sensor, the liquid SOG outside of a dispenser nozzle in an abnormal length relative to the dispenser nozzle; adjusting, using a controller, a suck back (SB) valve to withdraw liquid SOG from the abnormal length; comparing a sensed amount of liquid SOG deposited onto the semiconductor wafer, from a second sensor, with at least one operating parameter prior to the adjusting; pausing sensing of an amount of liquid SOG dispensed onto the semiconductor wafer based on the sensed amount of liquid SOG deposited being outside the at least one operating parameter; and storing at least one signal from the second sensor in the controller based on the sensed amount of liquid SOG deposited being outside the at least one operating parameter. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
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12. A method of manufacturing a semiconductor device, comprising:
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detecting, using a sensor, liquid SOG outside of a dispenser nozzle in an abnormal length relative to the dispenser nozzle; adjusting, using a controller, a suck back (SB) valve to withdraw liquid SOG from the abnormal length; comparing a sensed amount of liquid SOG deposited onto the semiconductor wafer from the dispenser nozzle with at least one set operating parameter; and pausing sensing of a duration of dispensing liquid SOG onto the semiconductor wafer based on the sensed amount of liquid SOG deposited being outside the at least one operating parameter; and storing at least one signal in the controller based on the sensed amount of liquid SOG deposited being outside the at least one operating parameter. - View Dependent Claims (13, 14)
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15. A method of controlling deposition of liquid spin-on glass (SOG) onto a semiconductor wafer, the method comprising:
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dispensing, for a duration, the liquid SOG onto the semiconductor wafer; determining, after the duration, a length of the liquid SOG outside of a dispenser nozzle using a sensor; adjusting, using a controller, a suck back (SB) valve to reduce the length of liquid SOG if the length is below a predetermined threshold; comparing a sensed amount of liquid SOG deposited onto the semiconductor wafer from the dispensing with at least one set operating parameter; and pausing sensing of a volume of liquid SOG dispensed onto the semiconductor wafer based on the sensed amount of liquid SOG deposited being outside the at least one operating parameter; and storing at least one signal in the controller based on the sensed amount of liquid SOG deposited being outside the at least one operating parameter. - View Dependent Claims (16, 17, 18, 19, 20)
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Specification