Packaging structure, display device, and fabrication method thereof
First Claim
1. A packaging structure for a display device, comprising:
- at least one inorganic layer and at least one passivation layer,wherein;
the at least one passivation layer includes a halogen-containing amorphous solid oxide thin film having a crosslinked-polyhedra-network structure,the at least one passivation layer includes a first active thin-film layer and a second active thin-film layer,a mole ratio of oxygen atom to halogen atom in the first active thin-film layer is lower than a mole ratio of oxygen atom to halogen atom in the second active thin-film layer,the at least one passivation layer covers an entire surface of the at least one inorganic layer,the at least one inorganic layer is arranged between a display layer of the display device and the at least one passivation layer, and directly combined with the display layer,the first active thin-film layer in the at least one passivation layer is arranged between the display layer of the display device and the second active thin-film layer in the at least one passivation layer, andthe first active thin-film layer has a chemical formula of Bi0.6-0.8Si0.1-0.25Sn0.3-0.4W0.1.-0.15O0.3-0.8F0.6-0.8.
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0 Petitions
Accused Products
Abstract
A packaging structure includes at least one inorganic layer and at least one passivation layer. The at least one passivation layer includes a halogen-containing amorphous solid oxide thin film. The amorphous solid oxide thin film in the at least one passivation layer has a crosslinked-polyhedra-network structure. A display device includes a substrate, a display layer, and a packaging structure. The packaging structure further includes at least one inorganic layer and at least one passivation layer. The at least one passivation layer includes a halogen-containing amorphous solid oxide thin film. The amorphous solid oxide thin film in the at least one passivation layer has a crosslinked-polyhedra-network structure. A method for fabricating a display device includes providing a substrate, forming a display layer over the substrate, and forming a packaging structure over the display layer with the packaging structure including at least one inorganic layer and at least one passivation layer.
8 Citations
17 Claims
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1. A packaging structure for a display device, comprising:
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at least one inorganic layer and at least one passivation layer, wherein; the at least one passivation layer includes a halogen-containing amorphous solid oxide thin film having a crosslinked-polyhedra-network structure, the at least one passivation layer includes a first active thin-film layer and a second active thin-film layer, a mole ratio of oxygen atom to halogen atom in the first active thin-film layer is lower than a mole ratio of oxygen atom to halogen atom in the second active thin-film layer, the at least one passivation layer covers an entire surface of the at least one inorganic layer, the at least one inorganic layer is arranged between a display layer of the display device and the at least one passivation layer, and directly combined with the display layer, the first active thin-film layer in the at least one passivation layer is arranged between the display layer of the display device and the second active thin-film layer in the at least one passivation layer, and the first active thin-film layer has a chemical formula of Bi0.6-0.8Si0.1-0.25Sn0.3-0.4W0.1.-0.15O0.3-0.8F0.6-0.8. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13)
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14. A packaging structure for a display device, comprising:
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at least one inorganic layer and at least one passivation layer, wherein; the at least one passivation layer includes a halogen-containing amorphous solid oxide thin film; and the amorphous solid oxide thin film in the at least one passivation layer has a crosslinked-polyhedra-network structure, wherein the at least one passivation layer includes a first active thin-film layer and a second active thin-film layer, a mole ratio of oxygen atom to halogen atom in the first active thin-film layer is lower than a mole ratio of oxygen atom to halogen atom in the second active thin-film layer, the at least one passivation layer covers an entire surface of the at least one inorganic layer, the at least one inorganic layer is arranged between the display device and the at least one passivation layer, and the first active thin-film layer in the at least one passivation layer is arranged between the display device and the second active thin-film layer in the at least one passivation layer, wherein the first active thin-film layer has a chemical formula of Bi0.6-0.8Si0.1-0.25Sn0.3-0.4W0.1-0.15O0.3-0.8F0.6-0.8, and the second active thin-film layer has a chemical formula of Bi0.6-0.8Si0.1-0.25Sn0.3-0.4W0.1-0.15O0.3-0.4F0.6-0.8. - View Dependent Claims (15, 16, 17)
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Specification