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Plasma abatement of compounds containing heavy atoms

  • US 10,449,486 B2
  • Filed: 04/13/2017
  • Issued: 10/22/2019
  • Est. Priority Date: 03/06/2014
  • Status: Active Grant
First Claim
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1. An apparatus for abating effluent from a processing chamber, comprising:

  • a plasma source coupled to a gas line of a deposition chamber, the plasma source comprising;

    a first plate having an outer edge and an inner edge;

    a second plate parallel to the first plate, wherein the second plate has an outer edge and an inner edge;

    an inner wall disposed between the inner edges of the first and second plates, wherein the first plate and the second plate are concentric with the inner wall;

    an outer wall disposed between the outer edges of the first and second plates, the first plate, the second plate, the inner wall and the outer wall defining a plasma region;

    a first plurality of magnets disposed on the first plate; and

    a second plurality of magnets disposed on the second plate; and

    a reagent source positioned upstream of the plasma source, wherein the reagent source is coupled with the plasma source, and wherein the reagent source is operable to deliver an abating reagent to the plasma source.

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