Apparatus and methods for detecting overlay errors using scatterometry

• US 10,451,412 B2
• Filed: 06/02/2017
• Issued: 10/22/2019
• Est. Priority Date: 04/22/2016
• Status: Active Grant

• Current Assignee: KLA-Tencor Corporation
• Original Assignee: KLA-Tencor Corporation
• Inventors: Adel, Michael, Mieher, Walter D., Abdulhalim, Ibrahim, Levy, Ady, Friedmann, Michael
• Primary Examiner(s): Stark, Jarrett J
• Application Number:
  US15/613,119
• Publication Number:
  US 20170336198A1
• Time in Patent Office: 872 Days
• CPC Class Codes: G01B 11/272 using photoelectric detection means
• CPC Class Codes: G01N 21/4785 Standardising light scatter apparatus; Standards therefor
• CPC Class Codes: G01N 21/9501 Semiconductor wafers manufacturing processes per se of semiconductor devices implementing a measuring step H01L22/10
• CPC Class Codes: G03F 7/70633 Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching
• CPC Class Codes: H01L 21/68 for positioning, orientation or alignment
• CPC Class Codes: H01L 21/682 Mask-wafer alignment in general G03F7/70, G03F9/70
• CPC Class Codes: H01L 23/544 Marks applied to semiconductor devices or parts, e.g. registration marks, alignment structures, wafer maps test patterns for characterising or monitoring manufacturing processes H01L22/00
• CPC Class Codes: Y10S 438/975 Substrate or mask aligning feature

Abstract

Disclosed is a method for determining an overlay error between at least two layers in a multiple layer sample. An imaging optical system is used to measure multiple measured optical signals from multiple periodic targets on the sample, and the targets each have a first structure in a first layer and a second structure in a second layer. There are predefined offsets between the first and second structures A scatterometry overlay technique is used to analyze the measured optical signals of the periodic targets and the predefined offsets of the first and second structures of the periodic targets to thereby determine an overlay error between the first and second structures of the periodic targets. The scatterometry overlay technique is a phase based technique, and the imaging optical system is configured to have an illumination and/or collection numerical aperture (NA) and/or spectral band selected so that a specific diffraction order is collected and measured for the plurality of measured optical signals. In one aspect, the number of periodic targets equals half the number of unknown parameters.

Claims

1. A method for determining an overlay error between at least two layers in a multiple layer sample, the method comprising:

using an imaging system to measure a plurality of measured signals from a plurality of periodic targets on the sample, wherein the targets each have a first structure in a first layer and a second structure in a second layer, wherein there are predefined offsets between the first and second structures, wherein the periodic targets and their surrounding measurement areas are designed to be identical in all aspects except the predefined offsets so that a difference in measured signals from the periodic targets is dependent on the predefined offsets and any overlay error while also being independent of profile and film characteristics of such periodic targets; and

using a scatterometry overlay technique to analyze the measured signals of the periodic targets and the predefined offsets of the first and second structures of the periodic targets to thereby determine an overlay error between the first and second structures of the periodic targets,

wherein the scatterometry overlay technique is a phase based technique that includes representing each of a plurality of difference signals, which are generated from the measured signals, as a set of periodic functions having a plurality of known parameters and a plurality of unknown parameters that include an unknown overlay error parameter and analyzing the set of periodic functions to solve for the unknown overlay error parameter to thereby determine the overlay error without a model, wherein the measured signals and their difference signals are independent of profile and film characteristics of the periodic targets,

wherein the imaging system is configured to have an illumination and/or collection numerical aperture (NA) and/or spectral band selected so that a specific diffraction order of the measured signals is selectively collected and measured.

2. A method as recited in claim 1, wherein the illumination NA of the imaging system equals the collection NA, an incident beam of the imaging system is normal to a surface of the sample, and the imaging system is configured to meet a following condition:

nλ

=d(NA_i+NA_c)

wherein n equals 1, λ

is a wavelength, d is a pitch of a target'"'"'s structures, NA_i is the illumination numerical aperture, and NA_c is the collection numerical aperture.

3. A method as recited in claim 1, wherein the illumination NA of the imaging system equals the collection NA, an incident beam of the imaging system is normal to a surface of the sample, and the imaging system is configured to meet a following condition:

nλ

≥

2dNA(1+ε

)

wherein n equals 1, λ

is a wavelength, d is a pitch of a target'"'"'s structures, NA is the numerical aperture of the imaging system, and ε

is an approximation factor for structures of the periodic targets which are not infinitely periodic.

4. A method as recited in claim 3, wherein ε

is about less than 0.5.

5. A method as recited in claim 1, wherein the analysis of the measured signals includes deriving spectral information from the measured signals using a transform.

6. A method as recited in claim 1, wherein the overlay error is determined without comparing any of the measured signals to a known or reference signal from a sample target having a known overlay error.

7. A method as recited in claim 1, wherein the overlay error is determined without comparing the measured signals to calibration data.

8. The method of claim 1, wherein the number of periodic targets equals half the number of unknown parameters.

9. A method for determining overlay between a plurality of first structures in a first layer of a sample and a plurality of second structures in a second layer of the sample, the method comprising:

providing a plurality of periodic targets that each include a portion of the first and second structures and each is designed to have a predefined offset between its first and second structure portions, wherein the periodic targets and their surrounding measurement areas are designed to be identical in all aspects except the predefined offsets so that a difference in measured signals from the periodic targets is dependent on the predefined offsets and any overlay error while also being independent of profile and film characteristics of such periodic targets;

illuminating the periodic targets with electromagnetic radiation to thereby obtain detected output radiation from each periodic target at a −

1st diffraction order and a +1st diffraction order; and

determining any overlay error between the first structures and the second structures using a scatterometry technique based on the detected output radiation by;

for each target, determining a first differential intensity of the detected output radiation between the −

1st diffraction order and the +1st diffraction order,

for a plurality of pairs of periodic targets each having a first periodic target and a second periodic target, determining a second differential intensity between the first differential intensity of the first periodic target and the first differential intensity of the second periodic target, and

determining any overlay error between the first structures and the second structures using a scatterometry technique directly from the second differential intensities determined from each periodic target pair without use of a model, wherein the scatterometry technique is a phase based technique that includes representing each of the second differential intensities as a set of periodic functions having a plurality of known parameters and a plurality of unknown parameters that include an unknown overlay error parameter and analyzing the set of periodic functions to solve for the unknown overlay error parameter to thereby determine the overlay error without the model,

wherein the imaging system is configured to have an illumination and/or collection aperture and/or spectral band selected so that the −

1st diffraction order and the +1st diffraction order of the output radiation from each periodic target is selected for detection.

10. A method as recited in claim 9, wherein the overlay error is determined without comparing any of the detected output radiation to a known or reference signal from a sample target having a known overlay error.

11. A method as recited in claim 9, wherein the overlay error is determined without comparing the detected output radiation to calibration data.

12. A method for determining an overlay error between at least two layers in a multiple layer sample, the method comprising:

(a) using the system to measure a plurality of measured signals from a plurality of periodic targets on the sample, wherein the periodic targets each have a first structure in a first layer and a second structure in a second layer, wherein there are predefined offsets between the first and second structures, wherein the periodic targets and their surrounding measurement areas are designed to be identical in all aspects except the predefined offsets so that a difference in measured signals from the periodic targets is dependent on the predefined offsets and any overlay error while also being independent of profile and film characteristics of such periodic targets; and

(b) using a scatterometry overlay technique to analyze the measured signals of the periodic targets and the predefined offsets of the first and second structures of the periodic targets to thereby determine and store an overlay error between the first and second structures of the periodic targets, wherein the scatterometry overlay technique is a phase based technique that includes representing each of a plurality of difference signals, which are generated from the measured signals as a set of periodic functions having a plurality of known parameters and a plurality of unknown parameters that include an unknown overlay error parameter and analyzing the set of periodic functions to solve for the unknown overlay error parameter to thereby determine the overlay error without a model, wherein the number of periodic targets equals half the number of unknown parameters, wherein the measured signals and the difference signals are independent of profile and film characteristics of the periodic targets, and wherein the overlay error is determined directly from the sets of periodic functions without a model.

13. A method as recited in claim 12, wherein the imaging system has a broadband source for generating an incident beam having multiple wavelengths, a detector for detecting a measured signal from the sample in response to the incident beam and a filter for selectively passing particular one or more wavelengths of the output signal to the detector, wherein using the imaging system includes directing at least one radiation beam towards each target to measure a plurality of measured signals from the periodic targets while adjusting the filter so as to pass a particular one or more wavelengths of the measured signals through the filter towards the detector in the form of a plurality filtered signals.

14. A method as recited in claim 12, wherein the imaging system comprises a spatial filter for selectively filtering the signal measured from the sample to thereby measure the signal from each of the periodic targets while spatially filtering at least a portion of at least one of the measured optical signals.