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Deposition of organic films

  • US 10,453,701 B2
  • Filed: 04/12/2017
  • Issued: 10/22/2019
  • Est. Priority Date: 06/01/2016
  • Status: Active Grant
First Claim
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1. A process for forming an etch mask on a first surface of a substrate comprising the first surface and a second surface, the process comprising:

  • contacting the substrate with a first vapor phase precursor; and

    contacting the substrate with a second vapor phase precursor;

    wherein contacting the substrate with the first and second vapor phase precursors forms an organic film selectively on the first surface relative to the second surface,wherein the etch mask comprises the organic film formed on the first surface of the substrate.

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