Semiconductor device which comprises transistor and diode
First Claim
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1. A semiconductor device, comprising:
- a substrate;
a transistor that comprises a first electron transit layer and an electron supply layer which are stacked in a thickness direction of the substrate;
a second electron transit layer formed above the first electron transit layer and the electron supply layer in parallel to the first electron transit layer and the electron supply layer;
an anode electrode that forms a Schottky junction with the second electron transit layer; and
a cathode electrode that forms an ohmic junction with the second electron transit layer, whereinthe anode electrode is connected to a source of the transistor, andthe cathode electrode is connected to a drain of the transistor,wherein the transistor is located between the substrate and the second electron transit layer; and
the first electron transit layer and the electron supply layer are located between the substrate and the second electron transit layer, in the thickness direction of the substrate.
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Abstract
A transistor which includes an electron transit layer and an electron supply layer which are stacked in a thickness direction of a substrate; an electron transit layer formed over the substrate in parallel to the electron transit layer and the electron supply layer; an anode electrode which forms a Schottky junction with the electron transit layer; and a cathode electrode which forms an ohmic junction with the electron transit layer are provided. The anode electrode is connected to a source of the transistor, and the cathode electrode is connected to a drain of the transistor.
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Citations
4 Claims
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1. A semiconductor device, comprising:
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a substrate; a transistor that comprises a first electron transit layer and an electron supply layer which are stacked in a thickness direction of the substrate; a second electron transit layer formed above the first electron transit layer and the electron supply layer in parallel to the first electron transit layer and the electron supply layer; an anode electrode that forms a Schottky junction with the second electron transit layer; and a cathode electrode that forms an ohmic junction with the second electron transit layer, wherein the anode electrode is connected to a source of the transistor, and the cathode electrode is connected to a drain of the transistor, wherein the transistor is located between the substrate and the second electron transit layer; and the first electron transit layer and the electron supply layer are located between the substrate and the second electron transit layer, in the thickness direction of the substrate.
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2. A semiconductor device, comprising:
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a substrate; a buffer layer formed above the substrate; a first electron transit layer formed above the buffer layer; an electron supply layer formed above the first electron transit layer; a cap layer formed above the electron supply layer; an insulating layer formed above the cap layer; and a second electron transit layer formed above the insulating layer, wherein the cap layer is located between the electron supply layer and the insulating layer, in the thickness direction of the substrate. - View Dependent Claims (3, 4)
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Specification