Gas-barrier multilayer film

• US 10,457,788 B2
• Filed: 12/22/2010
• Issued: 10/29/2019
• Est. Priority Date: 12/24/2009
• Status: Active Grant

• Current Assignee: Toyoda Gosei Company Limited (Toyota Motor Corporation)
• Original Assignee: Toyoda Gosei Company Limited (Toyota Motor Corporation)
• Inventors: Tsumagari, Yumi, Takatsu, Yoji, Inagaki, Kyoko, Okawa, Takeshi, Morihara, Yoshiharu, Matsuda, Syuusei
• Primary Examiner(s): Patel, Ronak C
• Application Number:
  US13/517,196
• Publication Number:
  US 20120270058A1
• Time in Patent Office: 3,233 Days
• Field of Search: None
• CPC Class Codes: C08J 2423/08 Copolymers of ethene C08J2423/16 takes precedence
• CPC Class Codes: C08J 2429/04 Polyvinyl alcohol; Partially hydrolysed homopolymers or copolymers of esters of unsaturated alcohols with saturated carboxylic acids
• CPC Class Codes: C08J 7/0423 with at least one layer of inorganic material and at least one layer of a composition containing a polymer binder
• CPC Class Codes: C08J 7/043 Improving the adhesiveness of the coatings per se, e.g. forming primers adhesives in the form of films or foils characterised by the primer layers between the polymer carriers and the adhesives C09J7/50
• CPC Class Codes: C08J 7/046 Forming abrasion-resistant coatings; Forming surface-hardening coatings
• CPC Class Codes: C08J 7/048 Forming gas barrier coatings
• CPC Class Codes: C08J 7/052 Forming heat-sealable coatings
• CPC Class Codes: H01L 31/049 Protective back sheets
• CPC Class Codes: Y02E 10/50 Photovoltaic [PV] energy
• CPC Class Codes: Y10T 428/31663 As siloxane, silicone or silane
• CPC Class Codes: Y10T 428/31667 Next to addition polymer from unsaturated monomers, or aldehyde or ketone condensation product
• CPC Class Codes: Y10T 428/31938 Polymer of monoethylenically unsaturated hydrocarbon

Abstract

A gas-barrier multilayer film, wherein (A) a first inorganic thin film layer, (C) a gas-barrier resin composition layer, and (D) a second inorganic thin film layer are stacked in this order with or without intervention of other layers on at least one surface of a plastic film, the gas-barrier resin composition layer (C) is formed from a gas-barrier resin composition comprising (a) a gas-barrier resin including an ethylene-vinyl alcohol-based copolymer, (b) an inorganic layered compound, and (c) at least one additive selected from coupling agents and crosslinking agents, and the content of the inorganic layered compound (b) in the gas-barrier resin composition is from 0.1% by mass to 20% by mass based on 100% by mass in total of the gas-barrier resin (a), the inorganic layered compound (b), and the additive (c).

Claims

1. A gas-barrier multilayer film, wherein

(A) a first inorganic thin film layer, (C) a gas-barrier resin composition layer, and (D) a second inorganic thin film layer are stacked in this order with or without intervention of other layers on at least one surface of a plastic film,

the gas-barrier resin composition layer (C) is formed from a gas-barrier resin composition comprising (a) a gas-barrier resin consisting of an ethylene-vinyl alcohol copolymer, (b) an inorganic layered compound, and (c) at least one additive selected from the group consisting of coupling agents and crosslinking agents, and the content of the inorganic layered compound (b) in the gas-barrier resin composition is from 0.1% by mass to 7.0% by mass based on 100% by mass in total of the gas-barrier resin (a), the inorganic layered compound (b), and the additive (c), and

the first inorganic thin film layer (A) and/or the second inorganic thin film layer (D) is a silicon oxide/aluminum oxide two-component inorganic oxide thin film, wherein the content of aluminum oxide is 20% by mass to 75% by mass.

2. The gas-barrier multilayer film according to claim 1, wherein the inorganic layered compound (b) is smectite.

3. The gas-barrier multilayer film according to claim 1, wherein the coupling agent is a silane coupling agent having at least one kind of organic functional group.

4. The gas-barrier multilayer film according to claim 1, wherein the cross-linking agent is a cross-linking agent for a group capable of forming a hydrogen bond.

5. The gas-barrier multilayer film according to claim 1, wherein the content of the additive (c) is from 0.3% by mass to 20% by mass based on 100% by mass in total of the gas-barrier resin (a), the inorganic layered compound (b), and the additive (c).

6. The gas-barrier multilayer film according to claim 1, which has (B) an anchor coating layer between the first inorganic thin film layer (A) and the gas-barrier resin composition layer (C).

7. The gas-barrier multilayer film according to claim 6, wherein an anchor coating agent composition for forming the anchor coating layer (B) comprises a silane coupling agent having at least one kind of organic functional group.

8. The gas-barrier multilayer film according to claim 7, wherein the content of the silane coupling agent in the anchor coating agent composition is from 0.1% by mass to 10% by mass based on 100% by mass of the anchor coating agent composition.

9. The gas-barrier multilayer film according to claim 8, wherein two or more repeating units are repeated where a multilayered structure comprising the anchor coating layer (B), the gas-barrier resin composition layer (C) and the second inorganic thin film layer (D) forms each of the units.

10. The gas-barrier multilayer film according to claim 7, wherein two or more repeating units are repeated where a multilayered structure comprising the anchor coating layer (B), the gas-barrier resin composition layer (C) and the second inorganic thin film layer (D) forms each of the units.

11. The gas-barrier multilayer film according to claim 6, wherein two or more repeating units are repeated where a multilayered structure comprising the anchor coating layer (B), the gas-barrier resin composition layer (C) and the second inorganic thin film layer (D) forms each of the units.

12. The gas-barrier multilayer film according to claim 1, which has a primer coating layer between the plastic film and the first inorganic thin film layer (A).