×

Gas-barrier multilayer film

  • US 10,457,788 B2
  • Filed: 12/22/2010
  • Issued: 10/29/2019
  • Est. Priority Date: 12/24/2009
  • Status: Active Grant
First Claim
Patent Images

1. A gas-barrier multilayer film, wherein(A) a first inorganic thin film layer, (C) a gas-barrier resin composition layer, and (D) a second inorganic thin film layer are stacked in this order with or without intervention of other layers on at least one surface of a plastic film,the gas-barrier resin composition layer (C) is formed from a gas-barrier resin composition comprising (a) a gas-barrier resin consisting of an ethylene-vinyl alcohol copolymer, (b) an inorganic layered compound, and (c) at least one additive selected from the group consisting of coupling agents and crosslinking agents, and the content of the inorganic layered compound (b) in the gas-barrier resin composition is from 0.1% by mass to 7.0% by mass based on 100% by mass in total of the gas-barrier resin (a), the inorganic layered compound (b), and the additive (c), andthe first inorganic thin film layer (A) and/or the second inorganic thin film layer (D) is a silicon oxide/aluminum oxide two-component inorganic oxide thin film, wherein the content of aluminum oxide is 20% by mass to 75% by mass.

View all claims
  • 1 Assignment
Timeline View
Assignment View
    ×
    ×