Grating with plurality of layers

• US 10,459,133 B1
• Filed: 04/26/2018
• Issued: 10/29/2019
• Est. Priority Date: 04/26/2018
• Status: Active Grant

• Current Assignee: Hewlett Packard Enterprise Development LP (Hewlett-Packard Enterprise Company)
• Original Assignee: Hewlett Packard Enterprise Development LP (Hewlett-Packard Enterprise Company)
• Inventors: Liang, Di, Kurczveil, Geza, Beausoleil, Raymond G.
• Primary Examiner(s): Stahl, Michael
• Application Number:
  US15/963,570
• Publication Number:
  US 20190331854A1
• Time in Patent Office: 551 Days
• Field of Search: None
• CPC Class Codes: G02B 2006/12061 Silicon
• CPC Class Codes: G02B 2006/12078 Gallium arsenide or alloys (GaAs, GaAlAs, GaAsP, GaInAs)
• CPC Class Codes: G02B 27/4272 having plural diffractive elements positioned sequentially along the optical path
• CPC Class Codes: G02B 5/1823 in an overlapping or superposed manner
• CPC Class Codes: G02B 5/1857 using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
• CPC Class Codes: G02B 6/12004 Combinations of two or more optical elements
• CPC Class Codes: G02B 6/1225 comprising photonic band-gap structures or photonic lattices
• CPC Class Codes: G02B 6/124 Geodesic lenses or integrated gratings
• CPC Class Codes: G02B 6/13 Integrated optical circuits characterised by the manufacturing method
• CPC Class Codes: G02B 6/136 by etching
• CPC Class Codes: G02B 6/34 utilising prism or grating G02B6/293 takes precedence
• CPC Class Codes: H01S 3/063 Waveguide lasers, i.e. whereby the dimensions of the waveguide are of the order of the light wavelength waveguide gas lasers H01S3/0315
• CPC Class Codes: H01S 3/2375 Hybrid lasers H01S3/07 takes precedence
• CPC Class Codes: H01S 5/0203 Etching
• CPC Class Codes: H01S 5/021 Silicon based substrates
• CPC Class Codes: H01S 5/1057 varying composition along the optical axis
• CPC Class Codes: H01S 5/2031 characterized by special waveguide layers, e.g. asymmetric waveguide layers or defined bandgap discontinuities

Abstract

A hybrid grating comprises a first grating layer composed of a first solid-state material, and a second grating layer over the first grating layer and composed of a second solid-state material, the second solid state-material being different than the first solid-state material and having a monocrystalline structure.

Claims

1. A grating, comprising:

a first grating layer composed of a silicon material, and comprising a set of silicon structures separated by a first set of gaps; and

a second grating layer over the first grating layer and composed of a III-V material, the III-V material having a monocrystalline structure, and comprising a set of III-V structures separated by a second set of gaps.

2. The grating of claim 1, wherein the first set of gaps and the second set of gaps are aligned.

3. The grating of claim 1, wherein the first set of gaps and the second set of gaps are unaligned.

4. The grating of claim 3, wherein the first grating layer further comprises a third set of gaps that are aligned with the second set of gaps.

5. The grating of claim 1, wherein one of the set of silicon structures and the set of III-V structures is periodic and the other one of the set of silicon structures and the set of III-V structures is aperiodic.

6. The grating of claim 1, further comprising a tuner to vary a modal index of at least one of the first or second grating layer.

7. The grating of claim 6, further comprising:

an oxide layer between the first grating layer and the second grating layer; and

wherein;

the first grating layer is a silicon structure that is one of n-type doped or p-type doped and the second grating layer is a III-V material structure that is the other of n-type doped or p-type doped; and

the tuner comprises a voltage source to apply a voltage across the first and second grating layers.

8. The grating of claim 6, wherein the tuner comprises a heater coupled to the second grating layer.