Optical coupling scheme
First Claim
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1. A waveguide structure for optical coupling between passive and active devices, the waveguide structure comprising:
- a SiN waveguide embedded in a cladding of a lower refractive index than the SiN waveguide, wherein the SiN waveguide operates in relevant wavelength ranges of (a) a 0-band with a range from 1260 nm to 1360 nm, (b) a C-band with a range from 1520 nm to 1570 nm, and/or (c) a L-band with a range from 1570 nm to 1610 nm;
a III-V waveguide of a higher refractive index than the cladding and is fabricated with an active device prior to transferring the III-V waveguide to a photonic integrated circuit;
an intermediate waveguide arranged with respect to the SiN waveguide and the waveguide to be at a same side of the intermediate waveguide; and
an optical coupling between the SiN waveguide and the waveguide through the intermediate waveguide.
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Abstract
A waveguide structure for optical coupling is provided. The waveguide structure includes a first waveguide embedded in a cladding of a lower refractive index than the first waveguide, a second waveguide of a higher refractive index than the cladding, and an intermediate waveguide. The first waveguide and the second waveguide are physically arranged at the same side of the intermediate waveguide to establish an optical coupling between the first waveguide and the second waveguide through the intermediate waveguide. The first waveguide material has a refractive index value smaller than or equal to 3.
20 Citations
14 Claims
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1. A waveguide structure for optical coupling between passive and active devices, the waveguide structure comprising:
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a SiN waveguide embedded in a cladding of a lower refractive index than the SiN waveguide, wherein the SiN waveguide operates in relevant wavelength ranges of (a) a 0-band with a range from 1260 nm to 1360 nm, (b) a C-band with a range from 1520 nm to 1570 nm, and/or (c) a L-band with a range from 1570 nm to 1610 nm; a III-V waveguide of a higher refractive index than the cladding and is fabricated with an active device prior to transferring the III-V waveguide to a photonic integrated circuit; an intermediate waveguide arranged with respect to the SiN waveguide and the waveguide to be at a same side of the intermediate waveguide; and an optical coupling between the SiN waveguide and the waveguide through the intermediate waveguide. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. A method for fabricating a waveguide structure for optical coupling, the method comprising:
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forming a silicon-on-insulator wafer substrate; forming an intermediate waveguide within a thin silicon layer of the silicon-on-insulator wafer substrate; covering the intermediate waveguide with a cladding and planarizing the cladding; forming a SiN waveguide on top of the planarized cladding, wherein the cladding comprises a lower refractive index than the SiN waveguide and the SiN waveguide has a relevant operating wavelength ranges of (i) a 0-band with a range from 1260 nm to 1360 nm, (ii) a C-band with a range from 1520 nm to 1570 nm, and/or (iii) a L-band with a range from 1570 nm to 1610 nm; annealing the formed SiN waveguide before and/or after patterning of the SiN waveguide; applying an overcladding material for embedding the SiN waveguide; locally removing the overcladding material to a thickness less than 200 nm above the intermediate waveguide; and forming a III-V waveguide in an area where the overcladding material is removed, wherein the III-V waveguide comprises a higher refractive index than the overcladding and is fabricated with an active device prior to transferring the III-V waveguide to a photonic integrated circuit. - View Dependent Claims (10, 11, 12, 13, 14)
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Specification