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Focus-dose co-optimization based on overlapping process window

  • US 10,459,345 B2
  • Filed: 02/23/2016
  • Issued: 10/29/2019
  • Est. Priority Date: 03/06/2015
  • Status: Active Grant
First Claim
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1. A method of improving a lithographic process of imaging a portion of a design layout onto a substrate using a lithographic apparatus, the method comprising:

  • during or before the imaging, adjusting, by a hardware computer system, a first processing parameter among processing parameters of the lithographic process to cause the imaging to be more tolerant to perturbations of at least one of the processing parameters; and

    during or before the imaging, adjusting, by the hardware computer system, a second processing parameter among processing parameters of the lithographic process to cause the imaging to be more tolerant to perturbations of at least one of the processing parameters,wherein adjustment of the first processing parameter and/or of the second processing parameter is under a constraint on an amount of adjustment such that the adjusting of the first and second processing parameters cannot adjust the first and second processing parameters, at a particular time, to both their values that cause the imaging to be maximally tolerant to perturbations of the first and second processing parameters.

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