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Lithographic apparatus and lithographic projection method

  • US 10,459,354 B2
  • Filed: 03/24/2016
  • Issued: 10/29/2019
  • Est. Priority Date: 04/23/2015
  • Status: Active Grant
First Claim
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1. A lithographic apparatus comprising:

  • a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam and having a transparent layer coupled thereto,a substrate table constructed to hold a substrate;

    a projection system configured to project the patterned radiation beam onto a target portion of the substrate; and

    a profiling system configured to determine a quantity representative of a deformation profile assumed by the transparent layer during a scanning movement within the lithographic apparatus,wherein the profiling system comprises a sensor system configured to sense the quantity during the scanning movement within the lithographic apparatus, the sensor system comprising;

    at least one laser output configured to radiate at least one laser beam at a grazing angle of incidence onto the transparent layer, anda detector to detect the at least one laser beam after reflection of the at least one laser beam at the transparent layer.

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