Lithographic apparatus and lithographic projection method

• US 10,459,354 B2
• Filed: 03/24/2016
• Issued: 10/29/2019
• Est. Priority Date: 04/23/2015
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Van De Ruit, Kevin, Paarhuis, Bart Dinand, Van Damme, Jean-Philippe Xavier, Onvlee, Johannes, Brouwer, Cornelis Melchior
• Primary Examiner(s): Ahmed, Jamil
• Application Number:
  US15/565,082
• Publication Number:
  US 20180095369A1
• Time in Patent Office: 1,314 Days
• CPC Class Codes: G01B 2210/56 Measuring geometric parameters of semiconductor structures, e.g. profile, critical dimensions or trench depth
• CPC Class Codes: G03F 1/62 Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
• CPC Class Codes: G03F 7/2002 with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
• CPC Class Codes: G03F 7/70258 Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
• CPC Class Codes: G03F 7/7085 Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
• CPC Class Codes: G03F 7/70983 Optical system protection, e.g. pellicles or removable covers for protection of mask

Abstract

A lithographic apparatus including a support to support a patterning device, a substrate table to hold a substrate, and a projection system to project a radiation beam patterned by the patterning device onto a target portion of the substrate. A transparent layer is provided to protect the pattering device. The apparatus further includes a transparent layer deformation-determining device to determine a deformation profile of the transparent layer, the deformation profile of the transparent layer expressing a deformation of the transparent layer during a scanning movement of the lithographic apparatus, and a compensator device which is configured to control the projection system, the substrate table and/or the support in response to the deformation profile of the transparent layer to compensate for the deformation of the transparent layer during the scanning movement of the apparatus.

Claims

1. A lithographic apparatus comprising:

a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam and having a transparent layer coupled thereto,

a substrate table constructed to hold a substrate;

a projection system configured to project the patterned radiation beam onto a target portion of the substrate; and

a profiling system configured to determine a quantity representative of a deformation profile assumed by the transparent layer during a scanning movement within the lithographic apparatus,

wherein the profiling system comprises a sensor system configured to sense the quantity during the scanning movement within the lithographic apparatus, the sensor system comprising;

at least one laser output configured to radiate at least one laser beam at a grazing angle of incidence onto the transparent layer, and

a detector to detect the at least one laser beam after reflection of the at least one laser beam at the transparent layer.

2. The lithographic apparatus according to claim 1, wherein the profiling system is configured to determine the quantity from a movement profile of the scanning movement within the lithographic apparatus and from a mathematical model of the transparent layer.

3. The lithographic apparatus according to claim 1, wherein the profiling system is configured to determine the quantity from a movement profile of the scanning movement within the lithographic apparatus and from a mathematical model of the transparent layer being subjected to a gas flow.

4. The lithographic apparatus according to claim 1, wherein the profiling system comprises a memory in which data is stored that is indicative of dynamic changes in the deformation profile of the transparent layer during a scanning movement within the lithographic apparatus, the data having been determined in advance.

5. The lithographic apparatus according to claim 4, further comprising an alignment sensor and wherein the profiling system is configured to derive the data from a measurement by the alignment sensor of an alignment profile during a scanning movement within the lithographic apparatus, and to store the data in the memory.

6. The lithographic apparatus according to claim 4, wherein the data as stored in the memory has been derived from a projection by the lithographic apparatus of a sequence of patterns onto a substrate during a scanning movement within the lithographic apparatus, and a measurement of an error in the projected patterns as obtained during the scanning movement within the lithographic apparatus.

7. The lithographic apparatus according to claim 4, wherein the scanning movement within the lithographic apparatus comprises an up-scan movement and a down-scan movement, the data having been derived from a comparison of a projection during the up-scan movement and a projection during the down-scan movement.

8. The lithographic apparatus according to claim 2, wherein the profiling system comprises a memory in which data is stored that is indicative of dynamic changes in the deformation profile of the transparent layer during a scanning movement within the lithographic apparatus, the data having been determined in advance and wherein the profiling system is configured to calibrate the mathematical model from the data as stored in the memory.

9. The lithographic apparatus according to claim 1, comprising a control system configured to control the projection system, the substrate table and/or the support under control of the quantity.

10. The lithographic apparatus according to claim 9, wherein the control system is configured to control the the projection system, the substrate table and/or the support during the scanning of the substrate from the quantity determined during a scanning of a preceding substrate.

11. The lithographic apparatus according to claim 9, wherein the control system is configured to control at least one selected from:

a position of a projection element of the projection system, a further position of the support and/or another position of the substrate table.

15. The lithographic apparatus according to claim 1, wherein the at least one laser output comprises multiple sets of laser outputs arranged in parallel and configured to radiate multiple sets of laser beams at a grazing angle of incidence onto the transparent layer.

12. A method of operating a lithographic apparatus, wherein the method comprises:

moving a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam, a transparent layer being coupled to the patterning device;

moving a substrate;

projecting the patterned radiation beam onto a target portion of the substrate;

determining a quantity, representative of a deformation profile of the transparent layer, during a scanning movement within the lithographic apparatus, wherein the deformation profile is determined by radiating at least one laser beam at a grazing angle of incidence onto the transparent layer, and by detecting the at least one laser beam after reflection of the at least one laser beam from the transparent layer.

13. The method according to claim 12, further comprising controlling the moving of the patterning device, the moving of the substrate and/or the projecting, under control of the quantity.

14. The method according to claim 12, wherein multiple sets of laser beams arranged in parallel are radiated at a grazing angle of incidence onto the transparent layer.

16. A non-transitory computer-readable medium comprising instructions configured to cause performance of:

radiation of at least one laser beam at a grazing angle of incidence onto a transparent layer coupled to a patterning device in a lithographic apparatus, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam for projection onto a target portion of a movable substrate;

detection of the at least one laser beam after reflection of the at least one laser beam from the transparent layer; and

determination of a quantity, representative of a deformation profile of a transparent layer, during a scanning movement within the lithographic apparatus, based on the detected at least one laser beam.

17. The computer-readable medium according to claim 16, wherein the instructions are configured to cause radiation of multiple laser beams arranged in parallel at a grazing angle of incidence onto the transparent layer.

18. The computer-readable medium according to claim 16, wherein the instructions are configured to cause determination of the quantity from a movement profile of the scanning movement within the lithographic apparatus and from a mathematical model of the transparent layer.

19. The computer-readable medium according to claim 16, wherein the instructions are configured to cause determination of the quantity from a movement profile of the scanning movement within the lithographic apparatus and from a mathematical model of the transparent layer being subjected to a gas flow.

20. The computer-readable medium according to claim 16, wherein the instructions are configured to use, for determination of the quantity, data stored in a memory that is indicative of dynamic changes in the deformation profile of the transparent layer during a scanning movement within the lithographic apparatus, the data having been determined in advance.