Apparatus and method for treating substrate

• US 10,460,923 B2
• Filed: 06/28/2017
• Issued: 10/29/2019
• Est. Priority Date: 06/30/2016
• Status: Active Grant

• Current Assignee: Semes Co., Ltd (Samsung Electronics Co. Ltd.)
• Original Assignee: Semes Co., Ltd (Samsung Electronics Co. Ltd.)
• Inventors: Kim, Young Ha, Choi, Se Jeong, Lee, Kang Suk, Kwark, Kiyoung, Park, Jeoung Eun, Park, Jeong Yeong
• Primary Examiner(s): Bergner, Erin F
• Application Number:
  US15/635,535
• Publication Number:
  US 20180005817A1
• Time in Patent Office: 853 Days
• CPC Class Codes: B08B 3/024 Cleaning by means of spray elements moving over the surface to be cleaned
• CPC Class Codes: B08B 3/08 the liquid having chemical or dissolving effect substances used, see the relevant classes
• CPC Class Codes: B08B 3/10 with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
• CPC Class Codes: H01L 21/02052 Wet cleaning only H01L21/02085 takes precedence
• CPC Class Codes: H01L 21/67051 using mainly spraying means, e.g. nozzles
• CPC Class Codes: H01L 21/68764 characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating caroussel

Abstract

Disclosed are an apparatus and a method for liquid-treating a substrate. The method for liquid-treating a substrate includes a first treatment liquid supplying operation of supplying a first treatment liquid to a treatment location of the substrate, and a wetting operation of, after the first treatment liquid supplying operation, supplying a wetting liquid onto the substrate, wherein the wetting operation includes a simultaneous supply operation of supplying the wetting liquid to the first location while the first treatment liquid is supplied, and wherein the first location is a location deviating from the treatment location. Accordingly, the surface of the substrate may be prevented from being dried while the treatment liquid is converted to a wetting liquid.

Claims

1. A method for liquid-treating a substrate, comprising:

a first treatment liquid supplying operation of supplying a first treatment liquid to a treatment location of the substrate, wherein the first treatment liquid includes hydrofluoric acid; and

a wetting operation of, after the first treatment liquid supplying operation, supplying a wetting liquid onto the substrate, wherein the wetting liquid is water,

wherein the wetting operation includes;

a simultaneous supply operation of supplying the wetting liquid to a first location while the first treatment liquid is supplied, and

wherein the first location is a location spaced apart from the treatment location.

2. The method of claim 1, wherein the treatment location corresponds to a central area of the substrate, and

wherein the first location corresponds to a peripheral area of the substrate.

3. The method of claim 2, wherein the wetting operation includes:

a first wetting operation of, after the simultaneous supply operation, supplying the wetting liquid to the first location of the substrate, and

wherein the supply of the first treatment liquid is stopped in the first wetting operation.

4. The method of claim 3, wherein the wetting operation further includes:

a second wetting operation of, after the first wetting operation, supplying the wetting liquid to the first location and a second location, and

wherein the second location corresponds to a central area of the substrate.

5. The method of claim 4, further comprising:

a second treatment liquid supplying operation of, after the second wetting operation, supplying a second treatment liquid, which is different from the first treatment liquid, onto the substrate.

6. A method for liquid-treating a substrate, comprising:

performing a pre-wetting operation including supplying a wetting liquid onto the substrate, wherein the wetting liquid is water;

performing a first treatment liquid supplying operation of, after the pre-wetting operation, supplying a first treatment liquid to a treatment location of the substrate, wherein the first treatment liquid includes hydrofluoric acid; and

performing a wetting operation of, after the first treatment liquid supplying operation, supplying the wetting liquid onto the substrate,

wherein the wetting operation includes;

a simultaneous supply operation of supplying the wetting liquid to a first location while the first treatment liquid is supplied, and

wherein the first location is a location spaced apart from the treatment location.

7. The method of claim 6, wherein the treatment location corresponds to a central area of the substrate, and

wherein the first location corresponds to a peripheral area of the substrate.

8. The method of claim 7, wherein the wetting operation includes:

a first wetting operation of, after the simultaneous supply operation, supplying the wetting liquid to the first location of the substrate, and

wherein the supply of the first treatment liquid is stopped in the first wetting operation.

9. The method of claim 8, wherein the wetting operation further includes:

a second wetting operation of, after the first wetting operation, supplying the wetting liquid to the first location and a second location, and

wherein the second location corresponds to a central area of the substrate.

10. The method of claim 9, further comprising:

a second treatment liquid supplying operation of, after the second wetting operation, supplying a second treatment liquid, which is different from the first treatment liquid, onto the substrate.