Method and apparatus for chemical mechanical polishing process
First Claim
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1. A method for processing a semiconductor wafer, comprising:
- transferring the semiconductor wafer from an interface tool to a chemical mechanical polishing (CMP) tool;
polishing the semiconductor wafer with the CMP tool;
transferring the semiconductor wafer back to the interface tool from the CMP tool; and
converting a mixture into a mist spray and discharging the mist spray over the semiconductor wafer in the interface tool after the semiconductor wafer is polished by the CMP tool.
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Abstract
A method for processing a semiconductor wafer is provided. The method includes transferring the semiconductor wafer from an interface tool to a Chemical Mechanical Polishing (CMP) tool. The method further includes polishing the semiconductor wafer with the CMP tool. The method also includes transferring the semiconductor wafer back to the interface tool from the CMP tool. In addition, the method includes converting a mixture to a mist spray and discharging the mist spray over the semiconductor wafer in the interface tool after the semiconductor wafer is polished by the CMP tool.
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Citations
20 Claims
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1. A method for processing a semiconductor wafer, comprising:
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transferring the semiconductor wafer from an interface tool to a chemical mechanical polishing (CMP) tool; polishing the semiconductor wafer with the CMP tool; transferring the semiconductor wafer back to the interface tool from the CMP tool; and converting a mixture into a mist spray and discharging the mist spray over the semiconductor wafer in the interface tool after the semiconductor wafer is polished by the CMP tool. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. A method for cleaning a semiconductor wafer after a chemical mechanical polishing (CMP) process, comprising:
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unloading a semiconductor wafer from a polishing head, which is configured for holding the semiconductor wafer during the CMP process, to a wafer stage; converting a mixture into a mist spray and discharging the mist spray over the semiconductor wafer supported by the wafer stage; transferring the semiconductor wafer from the wafer stage to a cleaning tool; and cleaning the semiconductor wafer in the cleaning tool. - View Dependent Claims (10, 11, 12, 13, 14, 15)
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16. A method for processing a semiconductor wafer, comprising:
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placing the semiconductor wafer in an interface tool; transferring the semiconductor wafer from the interface tool to a chemical mechanical polishing (CMP) tool; polishing the semiconductor wafer with the CMP tool; transferring the semiconductor wafer back to the interface tool from the CMP tool; converting a mixture into a mist spray and discharging the mist spray over the semiconductor wafer in the interface tool after the semiconductor wafer is polished by the CMP tool; transferring the semiconductor wafer from the interface tool to a cleaning tool; and cleaning the semiconductor wafer in the cleaning tool. - View Dependent Claims (17, 18, 19, 20)
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Specification