Advanced 3D inductor structures with confined magnetic field
First Claim
1. An apparatus, comprising:
- a substrate; and
an inductor residing in the substrate and comprising a conductive path that extends from a first terminal to a second terminal, wherein;
the conductive path has a shape corresponding to a two-dimensional (2D) lobe laid over a three-dimensional (3D) volume such that the inductor forms a first turn and a second turn that face one another and are substantially symmetrical with respect to a first plane, and a third turn and a fourth turn that are substantially symmetrical and face one another with respect to a second plane;
the first plane and the second plane are substantially orthogonal to one another; and
the inductor is at least partially formed from conductive layers and vias integrated in the substrate, wherein each of the vias is formed by a plurality of stacked metallic bars, which are shifted and rotated from each other.
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Abstract
Embodiments of an apparatus that includes a substrate and an inductor residing in the substrate are disclosed. In one embodiment, the inductor is formed as a conductive path that extends from a first terminal to a second terminal. The conductive path has a shape corresponding to a two-dimensional (2D) lobe laid over a three-dimensional (3D) volume. Since the shape of the conductive path corresponds to the 2D lobe laid over a 3D volume, the magnetic field generated by the inductor has magnetic field lines that are predominately destructive outside the inductor and magnetic field lines that are predominately constructive inside the inductor. In this manner, the inductor can maintain a high quality (Q) factor while being placed close to other components.
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Citations
20 Claims
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1. An apparatus, comprising:
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a substrate; and an inductor residing in the substrate and comprising a conductive path that extends from a first terminal to a second terminal, wherein; the conductive path has a shape corresponding to a two-dimensional (2D) lobe laid over a three-dimensional (3D) volume such that the inductor forms a first turn and a second turn that face one another and are substantially symmetrical with respect to a first plane, and a third turn and a fourth turn that are substantially symmetrical and face one another with respect to a second plane; the first plane and the second plane are substantially orthogonal to one another; and the inductor is at least partially formed from conductive layers and vias integrated in the substrate, wherein each of the vias is formed by a plurality of stacked metallic bars, which are shifted and rotated from each other. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20)
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Specification