Shutter disk for physical vapor deposition chamber

• US 10,468,292 B2
• Filed: 08/23/2016
• Issued: 11/05/2019
• Est. Priority Date: 09/22/2008
• Status: Active Grant

• Current Assignee: Applied Materials Incorporated
• Original Assignee: Applied Materials Incorporated
• Inventors: Brown, Karl M., Schaller, Jason
• Primary Examiner(s): Chen, Keath T
• Application Number:
  US15/245,004
• Publication Number:
  US 20160358809A1
• Time in Patent Office: 1,169 Days
• Field of Search: 1563453, 15634519
• CPC Class Codes: C23C 14/50 Substrate holders
• CPC Class Codes: H01J 37/32477 characterised by the means for protecting vessels or internal parts, e.g. coatings
• CPC Class Codes: H01L 21/67069 for drying etching
• CPC Class Codes: H01L 21/6719 characterized by the construction of the processing chambers, e.g. modular processing chambers
• CPC Class Codes: H01L 21/68707 the wafers being placed on a robot blade, or gripped by a gripper for conveyance
• CPC Class Codes: H01L 21/68785 characterised by the mechanical construction of the susceptor, stage or support

Abstract

A shutter disk suitable for shield a substrate support in a physical vapor deposition chamber is provided. In one embodiment, the shutter disk includes a disk-shaped body having an outer diameter disposed between a top surface and a bottom surface. The disk-shape body includes a double step connecting the bottom surface to the outer diameter.

Claims

1. A processing apparatus comprising:

a process chamber; and

a shutter disk comprising;

a disk-shaped body configured to cover a substrate support in the process chamber and configured to be transportable within the process chamber on a robot blade, the disk-shaped body comprising;

a top surface;

a side surface;

a bottom surface comprising;

an annular outer support surface;

a first annular outer stepped surface disposed radially inward of the annular outer support surface;

an annular inner stepped surface disposed radially inward of the first annular outer stepped surface;

a second annular outer stepped surface disposed radially inward of the annular inner stepped surface and coplanar with the first annular outer stepped surface, wherein the annular inner stepped surface extends further into the body than the first annular outer stepped surface and the second annular outer stepped surface; and

an annular inner support surface disposed radially inward of the second annular outer stepped surface, the annular inner support surface coplanar with the annular outer support surface.

2. The processing apparatus of claim 1, wherein the side surface of the body further comprises:

an annular side wall connected to the annular outer support surface and oriented substantially parallel to a centerline of the body and having a side wall diameter; and

an annular protrusion from the annular side wall disposed between the top surface and the bottom surface having an outer diameter larger than the side wall diameter.

3. The processing apparatus of claim 1, wherein the annular inner stepped surface, the first annular outer stepped surface, and the second annular outer stepped surface are substantially perpendicular to the centerline of the body.

4. The processing apparatus of claim 1, wherein the body further comprises:

a blind hole formed in the bottom surface of the body, a centerline of the blind hole co-linear with a centerline of the body.

5. The processing apparatus of claim 4, wherein the annular inner step surface extends further into the body than the first annular outer stepped surface and the second annular outer stepped surface but less than the blind hole.

6. The processing apparatus of claim 1, wherein the top surface of the body is coated with an aluminum coating.

7. The processing apparatus of claim 1, wherein the top surface of the body is coated with a twin-arc-spray aluminum coating.

8. The processing apparatus of claim 1, wherein the top surface is textured.

9. The processing apparatus of claim 8, wherein the top surface has a roughness average between about 600 R_a and about 800 R_a.

10. The processing apparatus of claim 1, wherein the body further comprises:

a sloped surface coupling the annular protrusion of the side surface to the top surface.

11. The processing apparatus of claim 10, wherein the sloped surface defines an angle between about 30 degrees and about 60 degrees.

12. The processing apparatus of claim 1, wherein the first annular outer stepped surface is larger than the second annular outer stepped surface.

13. The processing apparatus of claim 1, wherein the body is formed of a material having a coefficient of thermal expansion between 5 ppm/°

C. and about 17 ppm/°

C.

14. The processing apparatus of claim 1, wherein the annular protrusion of the side surface is rounded.

15. The processing apparatus of claim of claim 14, wherein the annular protrusion of the side surface has a full radius.