Spatially resolved optical emission spectroscopy (OES) in plasma processing
First Claim
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1. An apparatus for optical emission measurement, the apparatus comprising:
- a plasma processing chamber;
an optical window disposed on a wall of the plasma processing chamber; and
a collection system for collecting a plasma optical emission spectra through the optical window, the collection system including;
a mirror system configured to scan a plurality of non-coincident rays across the plasma processing chamber; and
a telecentric coupler for collecting an optical signal from a plasma and directing the optical signal to a spectrometer for measuring the plasma optical emission spectra, wherein a center of rotation of the plurality of non-coincident rays is substantially at the optical window.
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Abstract
Disclosed is a method, system, and apparatus for optical emission measurement. The apparatus includes a collection system for collecting a plasma optical emission spectra through an optical window disposed at a wall of a plasma processing chamber. The optical system includes a mirror configured to scan a plurality of non-coincident rays across the plasma processing chamber; and a telecentric coupler for collecting an optical signal from a plasma and directing the optical signal to a spectrometer for measuring the plasma optical emission spectra.
30 Citations
20 Claims
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1. An apparatus for optical emission measurement, the apparatus comprising:
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a plasma processing chamber; an optical window disposed on a wall of the plasma processing chamber; and a collection system for collecting a plasma optical emission spectra through the optical window, the collection system including; a mirror system configured to scan a plurality of non-coincident rays across the plasma processing chamber; and a telecentric coupler for collecting an optical signal from a plasma and directing the optical signal to a spectrometer for measuring the plasma optical emission spectra, wherein a center of rotation of the plurality of non-coincident rays is substantially at the optical window. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15)
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16. A system for plasma processing, comprising:
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a plasma processing chamber; an optical window disposed on a wall of the plasma processing chamber; a collection system for collecting plasma optical emission spectra through the optical window; a spectrometer coupled to the collection system for measuring the plasma optical emission spectra; and wherein the collection system includes a mirror system configured to scan a plurality of non-coincident rays across the plasma processing chamber, and a telecentric coupler for collecting an optical signal from a plasma and directing the optical signal to the spectrometer, wherein a center of rotation of the plurality of non-coincident rays is substantially at the optical window. - View Dependent Claims (19, 20)
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17. A method for optical emission measurement, comprising:
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depositing an optical window at a wall of a plasma processing chamber; providing a collection system for collecting plasma optical emission spectra through the optical window, the collection system including a mirror system and a telecentric coupler; scanning a plurality of non-coincident rays across the plasma processing chamber using the mirror system; collecting an optical signal from a plasma via the telecentric coupler; and directing the optical signal to a spectrometer for measuring the plasma optical emission spectra, wherein a center of rotation of the plurality of non-coincident rays is substantially at the optical window. - View Dependent Claims (18)
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Specification