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Spatially resolved optical emission spectroscopy (OES) in plasma processing

  • US 10,473,525 B2
  • Filed: 07/12/2017
  • Issued: 11/12/2019
  • Est. Priority Date: 11/01/2013
  • Status: Active Grant
First Claim
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1. An apparatus for optical emission measurement, the apparatus comprising:

  • a plasma processing chamber;

    an optical window disposed on a wall of the plasma processing chamber; and

    a collection system for collecting a plasma optical emission spectra through the optical window, the collection system including;

    a mirror system configured to scan a plurality of non-coincident rays across the plasma processing chamber; and

    a telecentric coupler for collecting an optical signal from a plasma and directing the optical signal to a spectrometer for measuring the plasma optical emission spectra, wherein a center of rotation of the plurality of non-coincident rays is substantially at the optical window.

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