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Rotating semi-batch ALD device

  • US 10,480,073 B2
  • Filed: 08/21/2015
  • Issued: 11/19/2019
  • Est. Priority Date: 04/07/2013
  • Status: Active Grant
First Claim
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1. A rotating semi-batch ALD device, comprising:

  • a vacuum container,a rotating susceptor,a plurality of substrates being processed disposed on the susceptor,a substrate heating heater,a plurality of substantially sector-shaped reaction gas supply means disposed in an upper portion of the vacuum container,a plurality of separate purge gas supply means disposed between the plurality of substantially sector-shaped reaction gas supply means, anda vacuum evacuation means provided as an independent separate system for each reaction gas,whereinthe rotating semi-batch ALD device repeatedly exposes the substrates to the reaction gas sequentially by rotating the susceptor to perform an ALD deposition,an entire circumference of each reaction gas supply means is surrounded by a different one of a plurality of first vacuum evacuation grooves as first parts of the vacuum evacuation means, andan entire circumference of each of the plurality of separate purge gas supply means is surrounded by a different one of a plurality of separate second vacuum evacuation grooves as second parts of the vacuum evacuation means.

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