Nanograting method and apparatus
First Claim
1. A method of manufacturing a waveguide having a combination of a binary grating structure and a blazed grating structure, the method comprising:
- cutting a substrate off-axis;
depositing a first layer on the substrate;
depositing a resist layer on the first layer, wherein the resist layer includes a pattern;
etching the first layer in the pattern using the resist layer as a mask, wherein the pattern includes a first region and a second region;
removing the resist layer;
coating a first polymer layer in the first region of the pattern;
etching the substrate in the second region of the pattern, creating the binary grating structure in the substrate in the second region;
removing the first polymer layer;
coating a second polymer layer in the second region of the pattern;
etching the substrate in the first region of the pattern, creating the blazed grating structure in the substrate in the first region;
removing the second polymer layer; and
removing the first layer from the substrate.
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Abstract
A method of manufacturing a waveguide having a combination of a binary grating structure and a blazed grating structure includes cutting a substrate off-axis, depositing a first layer on the substrate, and depositing a resist layer on the first layer. The resist layer includes a pattern. The method also includes etching the first layer in the pattern using the resist layer as a mask. The pattern includes a first region and a second region. The method further includes creating the binary grating structure in the substrate in the second region and creating the blazed grating structure in the substrate in the first region.
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Citations
12 Claims
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1. A method of manufacturing a waveguide having a combination of a binary grating structure and a blazed grating structure, the method comprising:
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cutting a substrate off-axis; depositing a first layer on the substrate; depositing a resist layer on the first layer, wherein the resist layer includes a pattern; etching the first layer in the pattern using the resist layer as a mask, wherein the pattern includes a first region and a second region; removing the resist layer; coating a first polymer layer in the first region of the pattern; etching the substrate in the second region of the pattern, creating the binary grating structure in the substrate in the second region; removing the first polymer layer; coating a second polymer layer in the second region of the pattern; etching the substrate in the first region of the pattern, creating the blazed grating structure in the substrate in the first region; removing the second polymer layer; and removing the first layer from the substrate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
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Specification