Etching composition
First Claim
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1. An etching composition, comprising:
- 1) at least one oxidizing agent comprising hydrogen peroxide, the at least one oxidizing agent being in an amount of from about 5% to about 20% by weight of the composition;
2) at least one chelating agent comprising diethylenetriaminepentaacetic acid, the at least one chelating agent being in an amount of from about 0.1% to about 1% by weight of the composition;
3) at least one metal corrosion inhibitor comprising substituted or unsubstituted benzotriazole, the at least one metal corrosion inhibitor being in an amount of from about 0.1% to about 1% by weight of the composition;
4) at least one organic solvent;
5) at least one amidine base comprising an amidine group in a fused non-aromatic ring, the at least one amidine base being in an amount of from about 0.3% to about 2% by weight of the composition; and
6) water;
wherein the composition has a pH of at least about 6.5 and at most about 9.5, and the composition does not contain an abrasive.
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Abstract
This disclosure relates to etching compositions containing 1) at least one oxidizing agent; 2) at least one chelating agent; 3) at least one metal corrosion inhibitor; 4) at least one organic solvent; 5) at least one amidine base; and 6) water.
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Citations
16 Claims
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1. An etching composition, comprising:
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1) at least one oxidizing agent comprising hydrogen peroxide, the at least one oxidizing agent being in an amount of from about 5% to about 20% by weight of the composition; 2) at least one chelating agent comprising diethylenetriaminepentaacetic acid, the at least one chelating agent being in an amount of from about 0.1% to about 1% by weight of the composition; 3) at least one metal corrosion inhibitor comprising substituted or unsubstituted benzotriazole, the at least one metal corrosion inhibitor being in an amount of from about 0.1% to about 1% by weight of the composition; 4) at least one organic solvent; 5) at least one amidine base comprising an amidine group in a fused non-aromatic ring, the at least one amidine base being in an amount of from about 0.3% to about 2% by weight of the composition; and 6) water; wherein the composition has a pH of at least about 6.5 and at most about 9.5, and the composition does not contain an abrasive. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16)
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Specification