Plasma etching systems and methods with secondary plasma injection

• US 10,504,700 B2
• Filed: 08/27/2015
• Issued: 12/10/2019
• Est. Priority Date: 08/27/2015
• Status: Active Grant

• Current Assignee: Applied Materials Incorporated
• Original Assignee: Applied Materials Incorporated
• Inventors: Tran, Toan Q., Park, Soonam, Weng, Zilu, Lubomirsky, Dmitry
• Primary Examiner(s): Chen, Keath T
• Application Number:
  US14/838,086
• Publication Number:
  US 20170062184A1
• Time in Patent Office: 1,566 Days
• Field of Search: 15634533
• CPC Class Codes: H01J 37/32082 Radio frequency generated discharge H01J37/32357, H01J37/32366, H01J37/32394 and H01J37/32403 take precedence
• CPC Class Codes: H01J 37/32357 Generation remote from the workpiece, e.g. down-stream
• CPC Class Codes: H01J 37/3244 Gas supply means
• CPC Class Codes: H01J 37/32532 Electrodes
• CPC Class Codes: H01J 37/32715 Workpiece holder

Abstract

An apparatus for plasma processing includes a first plasma source, a first planar electrode, a gas distribution device, a plasma blocking screen and a workpiece chuck. The first plasma source produces first plasma products that pass, away from the first plasma source, through first apertures in the first planar electrode. The first plasma products continue through second apertures in the gas distribution device. The plasma blocking screen includes a third plate with fourth apertures, and faces the gas distribution device such that the first plasma products pass through the plurality of fourth apertures. The workpiece chuck faces the second side of the plasma blocking screen, defining a process chamber between the plasma blocking screen and the workpiece chuck. The fourth apertures are of a sufficiently small size to block a plasma generated in the process chamber from reaching the gas distribution device.

Claims

1. An apparatus for plasma processing, comprising:

a gas source;

a first planar electrode comprising a first plate that defines a plurality of first apertures therethrough, a first side of the first planar electrode being configured with the gas source such that one or more gases from the gas source can pass through the plurality of first apertures to a second side of the first planar electrode;

a second planar electrode comprising a second plate that defines a plurality of second apertures therethrough, a first side of the second planar electrode being disposed facing the second side of the first planar electrode;

a first power supply configured to couple a first radio frequency (RF) power across the first planar electrode and the second planar electrode, wherein when the one or more gases pass through the plurality of first apertures and the first RF power couples across the first planar electrode and the second planar electrode,

a first plasma is generated, from the one or more gases, between the first planar electrode and the second planar electrode, and

first plasma products from the first plasma pass through the plurality of second apertures to a second side of the second planar electrode;

a plasma blocking screen comprising a third planar electrode that defines a plurality of third apertures therethrough, a first side of the plasma blocking screen being disposed facing the second side of the second planar electrode such that the first plasma products can pass through the plurality of third apertures to a second side of the plasma blocking screen;

a chuck that faces the second side of the plasma blocking screen, defining a process chamber between the plasma blocking screen and the chuck;

a lift plate that surrounds the chuck in the plane of an upper surface of the chuck, wherein;

the lift plate forms a radially inward portion, the plasma blocking screen being mechanically and electrically connected with an upward face of the radially inward portion;

the lift plate forms an uppermost surface disposed above the radially inward portion; and

the first electrode and the second electrode are supported by the uppermost surface, such that lifting the lift plate away from the chuck lifts the first, second and third electrodes away from the chuck; and

a second power supply that couples a second radio frequency (RF) power across the plasma blocking screen and the chuck, wherein when the one or more gases pass through the plurality of first apertures, the first RF power couples across the first planar electrode and the second planar electrode, and the second RF power couples across the plasma blocking screen and the chuck so that a second plasma is generated, from the one or more gases, between the plasma blocking screen and the chuck.

2. The apparatus of claim 1, wherein each of the third apertures defined by the plasma blocking screen is characterized by

a first aperture section that extends from the first side of the plasma blocking screen, and defines an aperture axis and a first aperture minor lateral dimension perpendicular to the aperture axis, and

a second aperture section that extends from the second side of the plasma blocking screen, and defines a second aperture minor lateral dimension, where it adjoins the first aperture section, that is about 0.05 inches or less, and is less than the first aperture minor lateral dimension;

wherein the first and second aperture sections adjoin axially to extend from the first side to the second side of the plasma blocking screen, to form the third aperture;

at least a portion of the second aperture section flares outwardly from the aperture axis toward the second side of the plasma blocking screen; and

at least the second side of the plasma blocking screen, and surfaces of the second aperture section, include a ceramic coating.

3. The apparatus of claim 1, the apparatus further comprising a ceramic spacer having:

a radial flange that rests on the upward face of the radially inward portion of the lift plate, and

a body that extends radially inward and downward from the radial flange, so as to be disposed between the chuck and the upward face of the radially inward portion of the lift plate, to reduce radial electric fields between the chuck and the lift plate.

4. The apparatus of claim 3, wherein:

the plasma blocking screen forms a rim member that extends downwardly from the second side of the plasma blocking screen, wherein the rim member mechanically and electrically connects with the radially inward portion of the lift plate through surface to surface contact with the lift plate, and so that the second side of the plasma blocking screen is disposed at a clearance height above the radially inward portion of the lift plate; and

a thickness of the radial flange of the ceramic spacer is less than the clearance height, so that the radial flange does not interrupt continuous, surface to surface electrical contact of the rim member of the plasma blocking screen with the radially inward portion of the lift plate.

5. The apparatus of claim 3, further comprising a ceramic pumping liner, disposed below the ceramic spacer and between the chuck and the lift plate, to further reduce the radial electric fields between the chuck and the lift plate.

6. The apparatus of claim 5, wherein the ceramic pumping liner is disposed below the radially inward portion of the lift plate.

7. The apparatus of claim 5, wherein the plane of the upper surface of the chuck passes through the ceramic pumping liner.

8. The apparatus of claim 5, wherein:

a lowermost surface of the ceramic spacer is a horizontally planar surface;

an uppermost surface of the ceramic pumping liner is a horizontally planar surface; and

when the lift plate is in a lowered position, the lowermost surface of the ceramic spacer rests on the uppermost surface of the ceramic pumping liner, to reduce radial electric fields between the chuck and the lift plate.

9. The apparatus of claim 5, wherein:

an outer edge of a gas distribution device is disposed atop the lift plate;

an outer edge of the second planar electrode is disposed atop the gas distribution device;

an insulator is disposed atop the second planar electrode; and

an outer edge of the first planar electrode is disposed atop the insulator, so that;

the lift plate is electrically connected with the gas distribution device and the second planar electrode;

the gas distribution device and the second planar electrode do not contact the lift plate directly; and

the gas distribution device and the second planar electrode are electrically isolated from the first planar electrode, so that the first RF power can be coupled across the first planar electrode and the second planar electrode.

10. The apparatus of claim 9, wherein the second power supply provides RF energy with a DC bias as the second RF power across the plasma blocking screen and the chuck.

11. The apparatus of claim 1, wherein at least a portion of the second plasma forms in the plane of the upward face of the radially inward portion of the lift plate.

12. The apparatus of claim 1, wherein the plane of a lowermost extent of the lift plate passes through the chuck.

13. An apparatus for plasma processing, comprising:

a process chamber that is defined laterally by one or more sidewalls, wherein the one or more sidewalls extend vertically, from below a chuck disposed within the process chamber, and terminate at upwardly facing surfaces that lie in a single horizontal plane;

a plasma source configured for generating first plasma products from one or more source gases, wherein the plasma source passes the first plasma products downwardly through first apertures of a planar electrode;

a plasma blocking screen that defines a plurality of second apertures therethrough, a first side of the plasma blocking screen being disposed facing the planar electrode such that the first plasma products pass through the plurality of second apertures to a second side of the plasma blocking screen;

a lift plate that is mechanically independent from the one or more sidewalls, and is configured to lift the plasma source and the plasma blocking screen upwards and away from the sidewalls, wherein the lift plate comprises an outermost element and an inward portion, wherein;

the outermost element forms an uppermost surface and a lowermost surface;

the uppermost surface is configured to support the plasma source and to lift the plasma source away from underlying structure when the lift plate is lifted;

the lowermost surface is configured to rest upon the upwardly facing surfaces of the one or more sidewalls at the single horizontal plane;

the inward portion is integrally formed with and extends radially inward from the outermost element;

the inward portion forms

an upper surface that is lower than the uppermost surface,

radially inward face and

a lower surface, and

the plasma blocking screen rests atop, and is electrically connected with, the upper surface of the inward portion of the lift plate;

the apparatus further comprising;

the chuck, wherein the chuck faces the second side of the plasma blocking screen.

14. The apparatus of claim 13, wherein:

the plasma blocking screen is electrically conductive, and the plasma blocking screen is electrically connected with the lift plate by making direct contact with the upper surface of the inward portion of the lift plate.

15. The apparatus of claim 14, wherein:

the plasma blocking screen forms a rim member that extends downwardly from the second side of the plasma blocking screen, wherein the rim member makes the direct contact with the upper surface of the inward portion of the lift plate.

16. The apparatus of claim 15, further comprising:

a ceramic spacer, comprising;

a radial flange that rests on the upper surface of the inward portion of the lift plate, and

a body that extends downward from the radial flange, a lowermost edge of the body extending at least to the lower surface of the inward portion of the lift plate;

wherein the radial flange of the ceramic spacer rests on the upper surface of the inward portion of the lift plate at a position that is radially inward from an area of contact between the rim member of the plasma blocking screen and the upper surface of the inward portion of the lift plate.

17. The apparatus of claim 16, further comprising a ceramic pumping liner that extends below the ceramic spacer, a portion of the ceramic pumping liner being disposed directly below the lower surface of the inward portion of the lift plate.

18. The apparatus of claim 17, wherein:

an uppermost surface of the ceramic pumping liner is planar;

a lowermost surface of the ceramic spacer is planar; and

when the lift plate is in a lowered position, the lowermost surface of the ceramic spacer is in face to face contact with the uppermost surface of the ceramic pumping liner, to reduce radial electric fields between the chuck and the lift plate.

19. The apparatus of claim 17, wherein the ceramic spacer and the ceramic pumping liner extend radially inward to a substantially identical radial position as one another, the radial position being intermediate between an innermost extent of the inward portion of the lift plate, and an outer diameter of the chuck.

20. The apparatus of claim 13, wherein:

the plasma blocking screen is configured to be held at electrical ground; and

the chuck is configured to receive RF energy and a DC bias, relative to the plasma blocking screen, to provide energy for a plasma to be generated between the chuck and the plasma blocking screen.