Systems and methods for improved semiconductor etching and component protection
First Claim
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1. A semiconductor processing system comprising:
- a remote plasma source;
a delivery tube coupled with the remote plasma source;
an adapter on which the remote plasma source is seated, wherein the adapter defines a port through the adapater, and wherein the delivery tube extends through a central aperture of the adapter;
an insert positioned within the delivery tube, wherein the insert provides access from the remote plasma source to a mixing region defined within the insert, and wherein the port defined through the adapter provides fluid access through the insert to the mixing region of the insert; and
a semiconductor processing chamber, wherein the semiconductor processing chamber comprises;
a gas box coupled about a distal region of the delivery tube,a first annular support contacting the gas box at a first surface of the first annular support, wherein the first annular support and the gas box together define a first channel about an interior region of the semiconductor processing chamber, anda gas distribution plate seated within the first channel.
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Abstract
Semiconductor systems and methods may include a semiconductor processing chamber having a gas box defining an access to the semiconductor processing chamber. The chamber may include a spacer characterized by a first surface with which the gas box is coupled, and the spacer may define a recessed ledge on an interior portion of the first surface. The chamber may include a support bracket seated on the recessed ledge that extends along a second surface of the spacer. The chamber may also include a gas distribution plate seated on the support bracket.
2022 Citations
13 Claims
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1. A semiconductor processing system comprising:
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a remote plasma source; a delivery tube coupled with the remote plasma source; an adapter on which the remote plasma source is seated, wherein the adapter defines a port through the adapater, and wherein the delivery tube extends through a central aperture of the adapter; an insert positioned within the delivery tube, wherein the insert provides access from the remote plasma source to a mixing region defined within the insert, and wherein the port defined through the adapter provides fluid access through the insert to the mixing region of the insert; and a semiconductor processing chamber, wherein the semiconductor processing chamber comprises; a gas box coupled about a distal region of the delivery tube, a first annular support contacting the gas box at a first surface of the first annular support, wherein the first annular support and the gas box together define a first channel about an interior region of the semiconductor processing chamber, and a gas distribution plate seated within the first channel. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13)
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Specification