Low resistivity films containing molybdenum
First Claim
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1. A method comprising:
- depositing a tungsten (W)-containing layer on a substrate by reacting a W-containing precursor with a reducing agent, wherein the reducing agent is a silicon (Si)-containing compound or a boron (B)-containing compound; and
depositing a molybdenum (Mo)-containing layer on the W-containing layer, wherein the Mo-containing layer is deposited by exposing the W-containing layer to a reducing agent and a Mo-containing precursor and wherein the substrate is exposed to the reducing agent at first substrate temperature and is exposed to the Mo-containing precursor at a second substrate temperature, wherein the first substrate temperature is less than the second substrate temperature.
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Abstract
Provided herein are low resistance metallization stack structures for logic and memory applications and related methods of fabrication. In some implementations, the methods involve providing a tungsten (W)-containing layer on a substrate; and depositing a molybdenum (Mo)-containing layer on the W-containing layer. In some implementations, the methods involve depositing a Mo-containing layer directly on a dielectric or titanium nitride (TiN) substrate without an intervening W-containing layer.
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Citations
20 Claims
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1. A method comprising:
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depositing a tungsten (W)-containing layer on a substrate by reacting a W-containing precursor with a reducing agent, wherein the reducing agent is a silicon (Si)-containing compound or a boron (B)-containing compound; and depositing a molybdenum (Mo)-containing layer on the W-containing layer, wherein the Mo-containing layer is deposited by exposing the W-containing layer to a reducing agent and a Mo-containing precursor and wherein the substrate is exposed to the reducing agent at first substrate temperature and is exposed to the Mo-containing precursor at a second substrate temperature, wherein the first substrate temperature is less than the second substrate temperature. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. A method comprising:
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flowing a reducing agent gas to a process chamber housing a substrate at a first substrate temperature to form a conformal reducing agent layer on the substrate; and exposing the conformal reducing agent layer to a molybdenum-containing precursor at a second substrate temperature to convert the conformal reducing agent layer to molybdenum. - View Dependent Claims (10, 11, 12, 13, 14, 17, 18, 19, 20)
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15. A method comprising:
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pulsing a reducing agent, wherein the reducing agent is boron (B)-containing, silicon (Si)-containing or germanium (Ge)-containing; and pulsing a Mo-containing precursor, wherein the Mo-containing precursor is reduced by the reducing agent or a product thereof to form a multi-component molybdenum-containing film containing one or more of B, Si, and Ge on a substrate. - View Dependent Claims (16)
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Specification