Semiconductor device including storage element
First Claim
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1. A semiconductor device comprising:
- a plurality of storage elements,wherein one of the plurality of storage elements includes;
a first transistor including;
a first gate electrode;
one of a first source electrode and a first drain electrode; and
the other of the first source electrode and the first drain electrode;
a second transistor including;
a second gate electrode;
one of a second source electrode and a second drain electrode; and
the other of the second source electrode and the second drain electrode; and
a third transistor including;
a third gate electrode;
one of a third source electrode and a third drain electrode; and
the other of the third source electrode and the third drain electrode,wherein the first transistor is provided in a substrate including a semiconductor material,wherein the second transistor includes an oxide semiconductor layer,wherein the first gate electrode and the one of the second source electrode and the second drain electrode are electrically connected to each other,wherein the other of the first source electrode and the first drain electrode and the one of the third source electrode and the third drain electrode are electrically connected to each other, andwherein the first transistor operates at a speed higher than that of the second transistor.
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Abstract
An object is to provide a semiconductor device with a novel structure. The semiconductor device includes a first wiring; a second wiring; a third wiring; a fourth wiring; a first transistor having a first gate electrode, a first source electrode, and a first drain electrode; and a second transistor having a second gate electrode, a second source electrode, and a second drain electrode. The first transistor is provided in a substrate including a semiconductor material. The second transistor includes an oxide semiconductor layer.
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Citations
21 Claims
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1. A semiconductor device comprising:
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a plurality of storage elements, wherein one of the plurality of storage elements includes; a first transistor including; a first gate electrode; one of a first source electrode and a first drain electrode; and the other of the first source electrode and the first drain electrode; a second transistor including; a second gate electrode; one of a second source electrode and a second drain electrode; and the other of the second source electrode and the second drain electrode; and a third transistor including; a third gate electrode; one of a third source electrode and a third drain electrode; and the other of the third source electrode and the third drain electrode, wherein the first transistor is provided in a substrate including a semiconductor material, wherein the second transistor includes an oxide semiconductor layer, wherein the first gate electrode and the one of the second source electrode and the second drain electrode are electrically connected to each other, wherein the other of the first source electrode and the first drain electrode and the one of the third source electrode and the third drain electrode are electrically connected to each other, and wherein the first transistor operates at a speed higher than that of the second transistor. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
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12. A semiconductor device comprising:
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a first wiring, a second wiring, and a plurality of storage elements connected in parallel between the first wiring and the second wiring, wherein one of the plurality of storage elements includes; a first transistor including; a first gate electrode; one of a first source electrode and a first drain electrode; and the other of the first source electrode and the first drain electrode; a second transistor including; a second gate electrode; one of a second source electrode and a second drain electrode; and the other of the second source electrode and the second drain electrode; and a third transistor including; a third gate electrode; one of a third source electrode and a third drain electrode; and the other of the third source electrode and the third drain electrode, wherein the first transistor is provided in a substrate including a semiconductor material, wherein the second transistor includes an oxide semiconductor layer, wherein the first gate electrode and the one of the second source electrode and the second drain electrode are electrically connected to each other, wherein the first wiring and the one of the first source electrode and the first drain electrode are electrically connected to each other, wherein the other of the first source electrode and the first drain electrode and the one of the third source electrode and the third drain electrode are electrically connected to each other, wherein the second wiring and the other of the third source electrode and the third drain electrode are electrically connected to each other. - View Dependent Claims (13, 14, 15, 16, 17, 18, 19, 20, 21)
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Specification