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Method for treating a semiconductor device

  • US 10,527,580 B2
  • Filed: 07/25/2018
  • Issued: 01/07/2020
  • Est. Priority Date: 07/05/2006
  • Status: Active Grant
First Claim
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1. A method of treating a sensor array, the sensor array including a plurality of sensors, a sensor of the plurality of the sensors including a sensor pad, a well structure defining a well array having a plurality of wells, a well of the plurality of wells disposed over each sensor of the sensor array and providing an opening to the sensor pad, the method comprising:

  • applying a wash solution to the well and at least the sensor pad and waiting for a first period between 30 seconds and 30 minutes, the wash solution including an acid and an organic solvent, wherein the organic solvent is selected from the group consisting of non-polar and polar aprotic organic solvents;

    rinsing at least the sensor pad with an alcohol having a normal boiling point in a range of 25°

    C. to 100°

    C.; and

    drying the sensor array.

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