×

Extreme ultraviolet photoresist and method

  • US 10,527,941 B2
  • Filed: 05/30/2017
  • Issued: 01/07/2020
  • Est. Priority Date: 05/30/2017
  • Status: Active Grant
First Claim
Patent Images

1. A method, comprising:

  • forming a resist layer over a substrate, wherein the resist layer includes a polymer backbone, an acid labile group (ALG) bonded to the polymer backbone, a sensitizer bonded to the polymer backbone, a photo-acid generator (PAG), and a thermo-base generator (TBG);

    performing an exposing process to the resist layer;

    baking the resist layer at a first temperature and subsequently at a second temperature, wherein the second temperature is higher than the first temperature; and

    developing the resist layer in a developer, thereby forming a patterned resist layer.

View all claims
  • 2 Assignments
Timeline View
Assignment View
    ×
    ×