Organosilica materials and uses thereof
First Claim
1. An organosilica material, which is a polymer of at least one trivalent metal oxide monomer and at least one independent monomer of Formula [Z1OZ2OSiCH2]3 (I), wherein Z1 represents a hydrogen atom, a C1-C4 alkyl group, a bond to a silicon atom of another monomer, or a combination thereof, and Z2 represents a hydrogen atom, a C1-C4 alkyl group, a bond to a silicon atom of another monomer, or a combination thereof, wherein the organosilica material has an X-ray diffraction pattern with one peak between 1 and 3 degrees 2θ
- and no peaks in the range of from 3 to 20 degrees 2θ
.
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Abstract
Organosilica materials, which are a polymer of at least one independent monomer of Formula [Z1OZ2OSiCH2]3 (I), wherein each Z1 and Z2 independently represent a hydrogen atom, a C1-C4 alkyl group or a bond to a silicon atom of another monomer and at least one other trivalent metal oxide monomer are provided herein. Methods of preparing and processes of using the organosilica materials, e.g., for catalysis etc., are also provided herein.
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Citations
19 Claims
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1. An organosilica material, which is a polymer of at least one trivalent metal oxide monomer and at least one independent monomer of Formula [Z1OZ2OSiCH2]3 (I), wherein Z1 represents a hydrogen atom, a C1-C4 alkyl group, a bond to a silicon atom of another monomer, or a combination thereof, and Z2 represents a hydrogen atom, a C1-C4 alkyl group, a bond to a silicon atom of another monomer, or a combination thereof, wherein the organosilica material has an X-ray diffraction pattern with one peak between 1 and 3 degrees 2θ
- and no peaks in the range of from 3 to 20 degrees 2θ
. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19)
- and no peaks in the range of from 3 to 20 degrees 2θ
Specification