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Dual-channel showerhead with improved profile

  • US 10,546,729 B2
  • Filed: 10/04/2016
  • Issued: 01/28/2020
  • Est. Priority Date: 10/04/2016
  • Status: Active Grant
First Claim
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1. A semiconductor processing chamber comprising:

  • a chamber housing at least partially defining an interior region of the semiconductor processing chamber, wherein the chamber housing comprises a lid;

    a pedestal configured to support a substrate within a processing region of the semiconductor processing chamber;

    a first showerhead positioned within the semiconductor processing chamber between the lid and the processing region;

    a faceplate positioned within the semiconductor processing chamber between the first showerhead and the processing region; and

    a second showerhead positioned within the semiconductor processing chamber between the faceplate and the processing region of the semiconductor processing chamber, wherein the second showerhead comprises at least two plates coupled together to define a volume between the at least two plates, wherein the at least two plates at least partially define channels through the second showerhead, and wherein each channel is characterized by a first diameter at a first end of the channel and is characterized by a plurality of ports at a second end of the channel.

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