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Edge ring for a substrate processing chamber

  • US 10,553,473 B2
  • Filed: 12/18/2015
  • Issued: 02/04/2020
  • Est. Priority Date: 12/19/2014
  • Status: Active Grant
First Claim
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1. An edge ring for a substrate processing chamber, the edge ring comprising:

  • an annular body comprising a first material; and

    a plurality of thermal breaks comprising a second material having a higher coefficient of thermal conductivity relative to the first material, whereineach of the plurality of thermal breaks is encapsulated within the first material of the annular body, the thermal breaks disposed perpendicular to a centerline of the annular body and configured to disperse heat laterally throughout the edge ring while inhibiting axial heat transfer along the centerline.

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