Fully aligned semiconductor device with a skip-level via
First Claim
1. A method for fabricating a semiconductor device, comprising:
- forming a memory element on a first metal layer;
forming a first cap layer on the first metal layer and sidewalls of the memory element;
forming a first dielectric layer on a top surface of the first cap layer on the first metal layer and a portion of the first cap layer on the sidewalls of the memory element;
forming a second metal layer on the first dielectric layer;
planarizing the second metal layer to form a planarized top surface with the first cap layer and the memory element;
selectively removing a portion of the memory element and forming an opening;
selectively depositing a second cap layer on the planarized top surface of the second metal layer;
depositing a second dielectric layer on the second cap layer and filling the opening;
selectively etching a via in the second dielectric layer and exposing a top surface of the memory element; and
depositing a third metal layer on the second dielectric layer and filling the via.
1 Assignment
0 Petitions
Accused Products
Abstract
A method includes forming a memory element on a first metal layer. A first cap layer is formed on the first metal layer and sidewalls of the memory element. A first dielectric layer is formed on the first cap layer and a portion of the cap layer on sidewalls of the memory element. A second metal layer is formed on the first dielectric layer. A portion of the memory element is removed and forms an opening. A second cap layer is formed on the top surface of the second metal layer. A second dielectric layer is deposited on the second cap layer and filling the opening. A via is etched in the second dielectric layer exposing a top surface of the memory element. A third metal layer is deposited on the second dielectric layer and filling the via.
-
Citations
20 Claims
-
1. A method for fabricating a semiconductor device, comprising:
-
forming a memory element on a first metal layer; forming a first cap layer on the first metal layer and sidewalls of the memory element; forming a first dielectric layer on a top surface of the first cap layer on the first metal layer and a portion of the first cap layer on the sidewalls of the memory element; forming a second metal layer on the first dielectric layer; planarizing the second metal layer to form a planarized top surface with the first cap layer and the memory element; selectively removing a portion of the memory element and forming an opening; selectively depositing a second cap layer on the planarized top surface of the second metal layer; depositing a second dielectric layer on the second cap layer and filling the opening; selectively etching a via in the second dielectric layer and exposing a top surface of the memory element; and depositing a third metal layer on the second dielectric layer and filling the via. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20)
-
Specification